Inventor · disambiguated record
Chi-Yuan Hung
Also filed as: HUNG CHI-YUAN
13 granted patents·11 pending applications·48 citations·filing 2001–2021
87Inventor score
Files withMACRONIX INT CO LTD3SEMICONDUCTOR MFG INT SHANGHAI3UNIV NAT CHENG KUNG3HUNG CHI YUAN2IND TECH RES INST2
Top patents by PatentIndex Score
24 records- 0181US8501376B2System and method for test pattern for lithography processHUNG CHI YUAN·Filed 2011·Granted Aug 6, 2013·5 cites·19 claims
- 0278US6887627B2Method of fabricating phase shift maskMACRONIX INT CO LTD·Filed 2002·Granted May 3, 2005·17 cites·18 claims
- 0375US9433932B2Hydrogenation catalyst and method of manufacturing the sameUNIV NAT CHENG KUNG·Filed 2014·Granted Sep 6, 2016·1 cites·21 claims
- 0474US7687594B2Random amorphous copolymer and manufacturing method thereofIND TECH RES INST·Filed 2008·Granted Mar 30, 2010·9 cites·28 claims
- 0567US6620564B2Method for patterning semiconductors through adjustment of image peak side lobesMACRONIX INT CO LTD·Filed 2002·Granted Sep 16, 2003·10 cites·15 claims
- 0660US12195609B2Reclaimed material for manufacturing shoes and method of producing reclaimed rubber by processing recycled shoe material wasteFENG TAY ENTPR CO LTD·Filed 2021·Granted Jan 14, 2025·0 cites·12 claims
- 0760US6635394B2Three dimensional maskMACRONIX INT CO LTD·Filed 2001·Granted Oct 21, 2003·6 cites·13 claims
- 0853US8921013B2System and method for test pattern for lithography processSEMICONDUCTOR MFG INT SHANGHAI·Filed 2013·Granted Dec 30, 2014·0 cites·20 claims
- 0949US9163139B2Extended film and the manufacturing method thereofIND TECH RES INST·Filed 2012·Granted Oct 20, 2015·0 cites·15 claims
- 1046US2016060391A1Copolymer based on dimethyl carbonate and method of preparing the sameUNIV NAT CHENG KUNG·Filed 2014·Application pending·0 cites
- 1146US2014354906A1Touch panel and method of adjusting the surface visual effect of touch panelWINTEK CORP·Filed 2014·Application pending·0 cites
- 1246US2015070794A1Touch panel and decoration panel thereofWINTEK CORP·Filed 2014·Application pending·0 cites
- 1342US2018251597A1Copolymer based on dimethyl carbonate and method of preparing the sameUNIV NAT CHENG KUNG·Filed 2018·Application pending·0 cites
- 1441US8541147B2System and method of selective optical pattern enhancement for semiconductor manufacturingHUNG CHI YUAN·Filed 2011·Granted Sep 24, 2013·0 cites·20 claims
- 1541US7914950B2Method and resulting structure for mosaic of multi-transmission rate optical mask structuresSEMICONDUCTOR MFG INT SHANGHAI·Filed 2005·Granted Mar 29, 2011·0 cites·18 claims
- 1640US2015029420A1Touch panelWU YI-CHUN·Filed 2014·Application pending·0 cites
- 1739US2014333578A1Touch panelWU YI-CHUN·Filed 2014·Application pending·0 cites
- 1837US10389513B2Dynamic adjustment of wait time valuesHEWLETT PACKARD ENTPR DEV LP·Filed 2017·Granted Aug 20, 2019·0 cites·20 claims
- 1937US2012099063A1Alignment film for spontaneously aligning liquid crystalHUNG CHI-TSUNG·Filed 2011·Application pending·0 cites
- 2036US7033709B2Method and structure for fabricating patterns on phase shift mask for the manufacture of semiconductor wafersSEMICONDUCTOR MFG INT SHANGHAI·Filed 2003·Granted Apr 25, 2006·0 cites·20 claims
- 2134US2003071983A1Method for improving resolution limits of a stepperFiled 2001·Application pending·0 cites
- 2233US2003073039A1Method of forming a patterned photoresist with a non-distorted profileFiled 2001·Application pending·0 cites
- 2333US2003077911A1Rom code mask with assistant featuresFiled 2001·Application pending·0 cites
- 2433US2003031935A1Chromeless phase shift maskFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →