Inventor · disambiguated record
Chul-Ju Hwang
Also filed as: HWANG CHUL-JU
20 granted patents·4 pending applications·554 citations·filing 1994–2009
96Inventor score
Top patents by PatentIndex Score
24 records- 0196US6634314B2Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectorsJUSUNG ENG CO LTD·Filed 2001·Granted Oct 21, 2003·139 cites·11 claims
- 0290US6656284B1Semiconductor device manufacturing apparatus having rotatable gas injector and thin film deposition method using the sameJUSUNG ENG CO LTD·Filed 2002·Granted Dec 2, 2003·46 cites·11 claims
- 0389US6872421B2Atomic layer deposition methodJUSUNG ENG CO LTD·Filed 2003·Granted Mar 29, 2005·36 cites·9 claims
- 0485US6026764AApparatus for low pressure chemical vapor depositionFiled 1999·Granted Feb 22, 2000·48 cites·6 claims
- 0583US6530993B2Cluster tool for fabricating semiconductor deviceJUSUNG ENG CO LTD·Filed 2001·Granted Mar 11, 2003·33 cites·17 claims
- 0682US6769629B2Gas injector adapted for ALD processJUSUNG ENG CO LTD·Filed 2002·Granted Aug 3, 2004·25 cites·4 claims
- 0781US7391098B2Semiconductor substrate, semiconductor device and method of manufacturing the sameJUSUNG ENG CO LTD·Filed 2005·Granted Jun 24, 2008·7 cites·10 claims
- 0879US5441570AApparatus for low pressure chemical vapor depositionJEIN TECHNICS CO LTD·Filed 1994·Granted Aug 15, 1995·48 cites·21 claims
- 0977US6190460B1Apparatus for low pressure chemical vapor depostionFiled 1999·Granted Feb 20, 2001·31 cites·3 claims
- 1076US6383953B2Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the sameJUSUNG ENG CO LTD·Filed 2001·Granted May 7, 2002·19 cites·9 claims
- 1176US5928427AApparatus for low pressure chemical vapor depositionFiled 1995·Granted Jul 27, 1999·31 cites·15 claims
- 1271US8889470B2Thin film type solar cell and method for manufacturing the sameKIM JAE HO·Filed 2009·Granted Nov 18, 2014·2 cites·20 claims
- 1365US6435197B2Method of cleaning a semiconductor fabricating apparatusJUSUNG ENG CO LTD·Filed 2001·Granted Aug 20, 2002·10 cites·4 claims
- 1461US6514837B2High density plasma chemical vapor deposition apparatus and gap filling method using the sameJUSUNG ENG CO LTD·Filed 2001·Granted Feb 4, 2003·4 cites·12 claims
- 1557US6565655B2High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the sameJUSUNG ENG CO LTD·Filed 2001·Granted May 20, 2003·6 cites·7 claims
- 1657US6009831AApparatus for low pressure chemical vapor depositionFiled 1999·Granted Jan 4, 2000·13 cites·10 claims
- 1756US6180542B1Method for forming a high-permittivity dielectric film use in a semiconductor deviceJU SUNG ENGINEERING CO LTD·Filed 1999·Granted Jan 30, 2001·23 cites·9 claims
- 1854US6124218AMethod for cleaning wafer surface and a method for forming thin oxide layersJUSUNG ENG CO LTD·Filed 1997·Granted Sep 26, 2000·14 cites·17 claims
- 1953US6338995B1High-permittivity dielectric capacitor for a semiconductor device and method for fabricating the sameJUSUNG ENG CO LTD·Filed 1999·Granted Jan 15, 2002·17 cites·3 claims
- 2048US6524430B1Apparatus for fabricating a semiconductor deviceJUSUNG ENG CO LTD·Filed 2000·Granted Feb 25, 2003·2 cites·5 claims
- 2139US2005000453A1Apparatus for semiconductor device and method using the sameFiled 2004·Application pending·0 cites
- 2238US2003015292A1Apparatus for fabricating a semiconductor deviceFiled 2000·Application pending·0 cites
- 2334US2001023136A1Method for fabricating gate oxide film of semiconductor deviceJUSUNG ENG CO LTD·Filed 2001·Application pending·0 cites
- 2434US2003015142A1Apparatus for fabricating a semiconductor deviceFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →