Inventor · disambiguated record
Chiharu Iriguchi
Also filed as: IRIGUCHI CHIHARU
16 granted patents·1 pending application·320 citations·filing 1999–2009
92Inventor score
Top patents by PatentIndex Score
17 records- 0197US7547589B2Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor deviceSEIKO EPSON CORP·Filed 2004·Granted Jun 16, 2009·262 cites·17 claims
- 0282US7073542B2Liquid quantity determination unit, photolithography apparatus, and liquid quantity determination methodSEIKO EPSON CORP·Filed 2003·Granted Jul 11, 2006·21 cites·13 claims
- 0369US7258957B2Method for aligning exposure mask and method for manufacturing thin film device substrateSEIKO EPSON CORP·Filed 2005·Granted Aug 21, 2007·2 cites·7 claims
- 0466US8610470B2Inverter circuitIRIGUCHI CHIHARU·Filed 2009·Granted Dec 17, 2013·5 cites·6 claims
- 0564US7643188B2Method of recording an exposure pattern in a recording layer of a holographic mask, method of forming an exposure pattern in a photosensitive material film, method of manufacturing a semiconductor device and method of manufacturing an electro-optic deviceSEIKO EPSON CORP·Filed 2007·Granted Jan 5, 2010·1 cites·10 claims
- 0663US7255968B2Alignment method of exposure mask and manufacturing method of thin film element substrateSEIKO EPSON CORP·Filed 2005·Granted Aug 14, 2007·1 cites·8 claims
- 0763US7049617B2Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing methodSEIKO EPSON CORP·Filed 2002·Granted May 23, 2006·6 cites·18 claims
- 0861US7670949B2Semiconductor device and method of manufacturing semiconductor deviceSEIKO EPSON CORP·Filed 2007·Granted Mar 2, 2010·1 cites·11 claims
- 0955US7352442B2Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading meansSEIKO EPSON CORP·Filed 2004·Granted Apr 1, 2008·3 cites·14 claims
- 1053US6690048B2Semiconductor device, manufacturing method thereof, and electronic apparatusSEIKO EPSON CORP·Filed 2001·Granted Feb 10, 2004·4 cites·13 claims
- 1152US7151044B2Thin film transistor type display device, method of manufacturing thin film element, thin film transistor circuit board, electro-optical device, and electronic apparatusSEIKO EPSON CORP·Filed 2004·Granted Dec 19, 2006·5 cites·3 claims
- 1250US6707126B2Semiconductor device including a PIN photodiode integrated with a MOS transistorSEIKO EPSON CORP·Filed 2001·Granted Mar 16, 2004·4 cites·8 claims
- 1345US7923293B2Method for manufacturing a semiconductor device wherein the electrical connection between two components is provided by capillary phenomenon of a liquid conductor material in a cavity therebetweenSEIKO EPSON CORP·Filed 2008·Granted Apr 12, 2011·0 cites·5 claims
- 1442US6328904B1Manufacture of a field emission element with fined emitter electrodeYAMAHA CORP·Filed 1999·Granted Dec 11, 2001·5 cites·11 claims
- 1541US7750380B2Semiconductor deviceSEIKO EPSON CORP·Filed 2007·Granted Jul 6, 2010·0 cites·14 claims
- 1639US7046408B2Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipmentSEIKO EPSON CORP·Filed 2004·Granted May 16, 2006·0 cites·11 claims
- 1734US2003203284A1Method for forming micropore, method for manufacturing semiconductor device, semiconductor device, display unit, and electronic deviceSEIKO EPSON CORP·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →