Inventor · disambiguated record
Chae Lyoung Kim
Also filed as: KIM CHAE LYOUNG
4 granted patents·8 pending applications·26 citations·filing 2010–2024
72Inventor score
Top patents by PatentIndex Score
12 records- 0188US8252675B2Methods of forming CMOS transistors with high conductivity gate electrodesLEE JONGWON·Filed 2010·Granted Aug 28, 2012·15 cites·15 claims
- 0284US10388537B2Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 20, 2019·3 cites·21 claims
- 0382US9306156B2Methods of manufacturing a magnetoresistive random access memory deviceNOH EUN-SUN·Filed 2014·Granted Apr 5, 2016·8 cites·19 claims
- 0472US12280466B2Substrate polishing apparatus, substrate polishing system including the same, and substrate polishing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Apr 22, 2025·0 cites·20 claims
- 0568US2022165562A1Cleaning liquid nozzle, cleaning apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0663US2021098261A1Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Application pending·0 cites
- 0756US2019348277A1Cleaning liquid nozzle, cleaning apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 0855US2024215248A1Semiconductor device and electronic system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0955US2025254854A1Semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1054US2018315613A1Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 1140US2014051246A1Methods of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 1236US2017297164A1Cleaning apparatus and substrate processing system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Chae Lyoung Kim files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →