Inventor · disambiguated record
Cha-Won Koh
Also filed as: KOH CHA-WON
55 granted patents·5 pending applications·817 citations·filing 1997–2024
98Inventor score
Files withSAMSUNG ELECTRONICS CO LTD31HYUNDAI ELECTRONICS IND15HYNIX SEMICONDUCTOR INC8KOH CHA-WON3PARK JIN2
Top patents by PatentIndex Score
60 records- 0198US9520289B2Methods of forming a pattern of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Dec 13, 2016·374 cites·19 claims
- 0297US10797056B2Semiconductor device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 6, 2020·7 cites·20 claims
- 0397US9772555B2Methods of forming patterns using photoresistsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 26, 2017·52 cites·18 claims
- 0495US8003543B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Aug 23, 2011·21 cites·18 claims
- 0594US8278221B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameKOH CHA-WON·Filed 2011·Granted Oct 2, 2012·18 cites·20 claims
- 0694US7540970B2Methods of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 2, 2009·27 cites·23 claims
- 0793US7732341B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 8, 2010·18 cites·21 claims
- 0891US7892982B2Method for forming fine patterns of a semiconductor device using a double patterning processSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 22, 2011·19 cites·20 claims
- 0990US6235447B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·38 cites·35 claims
- 1089US9147687B2Methods of fabricating semiconductor devicesKOH CHA-WON·Filed 2014·Granted Sep 29, 2015·10 cites·20 claims
- 1188US6599844B2Method and forming fine patterns of semiconductor devices using passivation layersHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jul 29, 2003·40 cites·17 claims
- 1286US10586798B2Semiconductor device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 10, 2020·4 cites·20 claims
- 1382US7560768B2Nonvolatile memory device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jul 14, 2009·8 cites·8 claims
- 1481US7687369B2Method of forming fine metal patterns for a semiconductor device using a damascene processSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Mar 30, 2010·7 cites·20 claims
- 1578US7862988B2Method for forming patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 4, 2011·6 cites·21 claims
- 1677US7452825B2Method of forming a mask structure and method of forming a minute pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 18, 2008·5 cites·12 claims
- 1776US9482953B2Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Nov 1, 2016·2 cites·18 claims
- 1876US7998874B2Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Aug 16, 2011·5 cites·12 claims
- 1976US6764806B2Over-coating composition for photoresist, and processes for forming photoresist patterns using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 20, 2004·17 cites·20 claims
- 2075US12372885B2Substrate processing apparatus and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Granted Jul 29, 2025·0 cites·19 claims
- 2175US7787301B2Flash memory device using double patterning technology and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Aug 31, 2010·4 cites·12 claims
- 2273US6399272B1Phenylenediamine derivative-type additive useful for a chemically amplified photoresistHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 4, 2002·11 cites·24 claims
- 2373US6387589B1Photoresist polymers and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 14, 2002·11 cites·24 claims
- 2472US11927890B1Substrate processing apparatus and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 12, 2024·0 cites·16 claims
- 2571US6200731B1Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Mar 13, 2001·11 cites·19 claims
- 2669US8557131B2Methods of forming fine patterns and methods of fabricating semiconductor devicesKOH CHA-WON·Filed 2011·Granted Oct 15, 2013·2 cites·20 claims
- 2769US7678650B2Nonvolatile memory device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Mar 16, 2010·3 cites·14 claims
- 2868US6368771B1Photoresist polymers and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 9, 2002·9 cites·27 claims
- 2967US9842852B2Methods of forming patterns using photoresist polymers and methods of manufacturing semiconductor devicesPARK JIN·Filed 2015·Granted Dec 12, 2017·1 cites·19 claims
- 3066US6984482B2Top-coating composition for photoresist and process for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 10, 2006·6 cites·8 claims
- 3165US7582899B2Semiconductor device having overlay measurement mark and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 1, 2009·3 cites·33 claims
- 3263US6627378B1Photoresist composition for top-surface imaging process by silylationHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 30, 2003·6 cites·21 claims
- 3362US7387869B2Method of forming pattern for semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 17, 2008·1 cites·17 claims
- 3462US6664031B2Process for forming photoresist pattern by using gas phase amine treatmentHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Dec 16, 2003·7 cites·12 claims
- 3561US6410670B1Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Jun 25, 2002·16 cites·9 claims
- 3661US2023130025A1Photoresist compositions and methods for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3759US6610616B2Method for forming micro-pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 26, 2003·5 cites·7 claims
- 3858US6858371B2Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Feb 22, 2005·5 cites·21 claims
- 3956US7842451B2Method of forming patternSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Nov 30, 2010·0 cites·19 claims
- 4056US6833326B2Method for forming fine patterns in semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Dec 21, 2004·6 cites·13 claims
- 4155US6699644B1Process for forming a photoresist pattern comprising alkaline treatmentHYUNDAI ELECTRONICS IND·Filed 2000·Granted Mar 2, 2004·4 cites·16 claims
- 4255US5888698APhotoresist film for deep ultra violet and method for forming photoresist film pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1997·Granted Mar 30, 1999·9 cites·6 claims
- 4353US10345701B2Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devicesPARK JIN·Filed 2017·Granted Jul 9, 2019·0 cites·15 claims
- 4451US6770415B2Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the sameHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 3, 2004·1 cites·9 claims
- 4548US7575855B2Method of forming patternSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 18, 2009·0 cites·22 claims
- 4648US7329477B2Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Feb 12, 2008·1 cites·7 claims
- 4748US6586619B2Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the sameHYUNDAI ELECTRONICS IND·Filed 2002·Granted Jul 1, 2003·1 cites·9 claims
- 4847US10688437B2Filter structure for chemical solution used in manufacturing integrated circuit and apparatus for supplying chemical solution including filter structure for chemical solutionSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jun 23, 2020·0 cites·20 claims
- 4947US7723702B2E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 25, 2010·0 cites·13 claims
- 5047US6348296B1Copolymer resin, preparation thereof, and photoresist using the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Feb 19, 2002·9 cites·15 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →