Inventor · disambiguated record

Ching-Sen Kuo

Also filed as: KUO CHING-SEN

34 granted patents·6 pending applications·218 citations·filing 2000–2025

96Inventor score

Technology areasH10P H10F H10W H10D G03F

Files withTAIWAN SEMICONDUCTOR MFG CO LTD30 TAIWAN SEMICONDUCTOR MFG7 FU SHIH-CHI1 LU WEN-CHEN1 TIAWAN SEMICONDUCTOR MFG CO LT1

Top patents by PatentIndex Score

40 records

0195US10121811B1Method of high-aspect ratio pattern formation with submicron pixel pitchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 6, 2018·12 cites·20 claims
0294US6645851B1Method of forming planarized coatings on contact hole patterns of various duty ratiosTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Nov 11, 2003·98 cites·38 claims
0393US12165867B2Method for reducing charging of semiconductor wafersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 10, 2024·1 cites·20 claims
0492US11769662B2Method for reducing charging of semiconductor wafersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 26, 2023·2 cites·20 claims
0590US10090357B2Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forcesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Oct 2, 2018·5 cites·20 claims
0689US10546889B2Method of high-aspect ratio pattern formation with submicron pixel pitchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jan 28, 2020·5 cites·20 claims
0788US11049767B2Semiconductor device and methods of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 29, 2021·4 cites·20 claims
0886US11658031B2Implantation mask formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 23, 2023·1 cites·20 claims
0986US10734436B2Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forcesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 4, 2020·3 cites·20 claims
1086US10510587B2Method for manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·3 cites·20 claims
1183US10186542B1Patterning for substrate fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 22, 2019·3 cites·20 claims
1281US7189957B2Methods to improve photonic performances of photo-sensitive integrated circuitsTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Mar 13, 2007·6 cites·18 claims
1380US12293940B2Techniques for forming a deep trench isolation structure between photodiodes by forming a first set of trenches based on a first pattern and forming a second set of trenches based on a second patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 6, 2025·0 cites·20 claims
1480US12100592B2Implantation mask formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 24, 2024·0 cites·20 claims
1580US6803291B1Method to preserve alignment mark optical integrityTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Oct 12, 2004·32 cites·20 claims
1680US2025069881A1Method for reducing charging of semiconductor wafersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
1778US2024379357A1Implantation mask formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
1878US2024404877A1Methods of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
1977US2025233013A1Double patterning techniques for forming a deep trench isolation structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2076US7443005B2Lens structures suitable for use in image sensors and method for making the sameTIAWAN SEMICONDUCTOR MFG CO LT·Filed 2004·Granted Oct 28, 2008·24 cites·22 claims
2175US11665897B2Improving surface topography by forming spacer-like componentsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 30, 2023·0 cites·20 claims
2275US9917006B1Method of planarizating filmTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 13, 2018·2 cites·20 claims
2374USRE41697EMethod of forming planarized coatings on contact hole patterns of various duty ratiosTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Sep 14, 2010·4 cites·56 claims
2473US9040341B2Image device and methods of forming the sameLU WEN-CHEN·Filed 2012·Granted May 26, 2015·2 cites·20 claims
2572US11996432B2Image sensor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 28, 2024·0 cites·20 claims
2671US8809172B2Self-aligned patterning for deep implantation in a semiconductor structureTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 19, 2014·3 cites·20 claims
2770US11086221B2Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forcesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 10, 2021·0 cites·20 claims
2869US12456649B2Semiconductor device and methods of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 28, 2025·0 cites·20 claims
2965US11276699B2Surface topography by forming spacer-like componentsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 15, 2022·0 cites·20 claims
3065US2022285203A1Double patterning techniques for forming a deep trench isolation structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
3164US10910260B2Method for manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 2, 2021·0 cites·20 claims
3262US6632590B1Enhance the process window of memory cell line/space dense pattern in sub-wavelength processTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Oct 14, 2003·8 cites·17 claims
3357US10522557B2Surface topography by forming spacer-like componentsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·0 cites·20 claims
3457US9437650B2Image device and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 6, 2016·0 cites·20 claims
3554US10366916B2Integrated circuit structure with guard ringTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 30, 2019·0 cites·20 claims
3654US8587084B2Seamless multi-poly structure and methods of making sameFU SHIH-CHI·Filed 2012·Granted Nov 19, 2013·0 cites·20 claims
3754US2024282582A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
3852US11411033B2Image sensor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 9, 2022·0 cites·14 claims
3952US10943783B2Method for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 9, 2021·0 cites·20 claims
4033US7101758B2Poly-etching method for split gate flash memory cellTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Sep 5, 2006·0 cites·20 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →