Inventor · disambiguated record
Chien-Jen Lai
Also filed as: LAI CHIEN-JEN
9 granted patents·1 pending application·26 citations·filing 2010–2023
84Inventor score
Top patents by PatentIndex Score
10 records- 0197US11435670B1Multi-component kernels for vector optical image simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 6, 2022·3 cites·20 claims
- 0296US10671786B2Method of modeling a mask by taking into account of mask pattern edge interactionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·7 cites·20 claims
- 0394US10466586B2Method of modeling a mask having patterns with arbitrary anglesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 5, 2019·5 cites·20 claims
- 0492US11754930B2Multi-component kernels for vector optical image simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 12, 2023·1 cites·20 claims
- 0588US11143955B2Method of modeling a mask having patterns with arbitrary anglesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 12, 2021·2 cites·20 claims
- 0687US8704198B2Efficient high-harmonic-generation-based EUV source driven by short wavelength lightKAERTNER FRANZ X·Filed 2010·Granted Apr 22, 2014·8 cites·13 claims
- 0784US12153349B2Multi-component kernels for vector optical image simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 26, 2024·0 cites·20 claims
- 0876US11994796B2Method of modeling a mask having patterns with arbitrary anglesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 28, 2024·0 cites·20 claims
- 0972US2023274063A1Method of modeling a mask by taking into account of mask pattern edge interactionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1071US11645443B2Method of modeling a mask by taking into account of mask pattern edge interactionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 9, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →