Inventor · disambiguated record

Chih-Teng Liao

Also filed as: LIAO CHIH-TENG

62 granted patents·36 pending applications·330 citations·filing 2016–2025

98Inventor score

Technology areasH10P H10W H10D H01L

Files withTAIWAN SEMICONDUCTOR MFG CO LTD98

Top patents by PatentIndex Score

98 records

0198US9812363B1FinFET device and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 7, 2017·237 cites·20 claims
0296US10170555B1Intermetallic doping film with diffusion in source/drainTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 1, 2019·19 cites·20 claims
0395US11282944B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 22, 2022·5 cites·20 claims
0495US10297555B2Integrated circuit structure having crown-shaped semiconductor strips and recesses in the substrate from etched dummy finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 21, 2019·10 cites·20 claims
0594US10522408B2FinFET device and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 31, 2019·8 cites·20 claims
0693US11837603B2Extended side contacts for transistors and methods forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 5, 2023·3 cites·20 claims
0792US12002855B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 4, 2024·1 cites·20 claims
0892US11075279B2Metal gate and contact plug design and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 27, 2021·7 cites·20 claims
0992US10163715B2FinFET device and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·6 cites·20 claims
1091US12165851B2Plasma processing method for manufacturing semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 10, 2024·2 cites·20 claims
1191US10121873B2Metal gate and contact plug design and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 6, 2018·6 cites·20 claims
1290US11621263B2Semiconductor device with short-resistant capacitor plateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 4, 2023·2 cites·20 claims
1390US11222805B2Etching apparatus and methods of cleaning thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 11, 2022·2 cites·20 claims
1490US10510875B2Source and drain structure with reduced contact resistance and enhanced mobilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·5 cites·20 claims
1589US11830937B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·1 cites·20 claims
1689US10679950B2Methods of forming recesses in substrates by etching dummy FinsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 9, 2020·4 cites·20 claims
1784US11522050B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 6, 2022·1 cites·20 claims
1884US10910223B2Doping through diffusion and epitaxy profile shapingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 2, 2021·3 cites·20 claims
1984US2025351557A1Semiconductor device with short-resistant capacitor plateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2084US2025343080A1End point control in etching processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2182US11430893B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 30, 2022·1 cites·20 claims
2281US11545562B2Source and drain structure with reduced contact resistance and enhanced mobilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 3, 2023·2 cites·20 claims
2381US11171003B2Doping through diffusion and epitaxy profile shapingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 9, 2021·2 cites·20 claims
2481US2025338614A1Extended side contacts for transistors and methods forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2581US2025351441A1Semiconductor device structure and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2680US12424568B2Method for forming recesses in a substrate by etching dummy finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 23, 2025·0 cites·20 claims
2780US12315864B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 27, 2025·0 cites·20 claims
2880US11824103B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 21, 2023·1 cites·20 claims
2980US2025364231A1Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3080US2025366003A1Semiconductor device and method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3179US11600713B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 7, 2023·2 cites·20 claims
3279US2024355663A1Etching apparatus and methods of cleaning thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3379US2025359227A1Forming Source And Drain Features In Semiconductor DevicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3478US2024387267A1Contact plugTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3578US2025364230A1Methods for retrofitting an etching apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3678US2024371650A1Fin field-effect transistor device and method of formingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3778US2025357205A1Semiconductor structure formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3877US12283623B2Semiconductor structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 22, 2025·0 cites·20 claims
3977US12125707B2Fin field-effect transistor device and method of formingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 22, 2024·0 cites·20 claims
4077US2024297253A1Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
4177US2025079177A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
4277US2025311266A1Source and Drain Structure with Reduced Contact Resistance and Enhanced MobilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
4377US2024379470A1End point control in etching processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
4476US2025254957A1Semiconductor structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
4575US12453168B2Semiconductor device with short-resistant capacitor plateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 21, 2025·0 cites·20 claims
4675US12433018B2Extended side contacts for transistors and methods forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 30, 2025·0 cites·20 claims
4775US12080582B2Etching apparatus and methods of cleaning thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 3, 2024·0 cites·20 claims
4875US12015085B2Method of manufacturing a semiconductor device including etching polysiliconTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
4974US12125748B2Contact plugTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 22, 2024·0 cites·20 claims
5074US11488912B2Method for forming recesses in a substrate by etching dummy finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 1, 2022·0 cites·19 claims

Showing the top 50 of 98 patent records by PatentIndex Score.

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →