Inventor · disambiguated record
Cheng-Kun Lin
Also filed as: LIN CHENG-KUN
11 granted patents·264 citations·filing 1995–2000
91Inventor score
Top patents by PatentIndex Score
11 records- 0187US6037204ASilicon and arsenic double implanted pre-amorphization process for salicide technologyTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Mar 14, 2000·94 cites·26 claims
- 0285US6030863AGermanium and arsenic double implanted pre-amorphization process for salicide technologyTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Feb 29, 2000·77 cites·24 claims
- 0379US6302948B1Textile ink-jet printing-purpose disperse dye micro-emulsion agentCHINA TEXTILE INST·Filed 2000·Granted Oct 16, 2001·14 cites·8 claims
- 0472US6030508ASputter etching chamber having a gas baffle with improved uniformityTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Feb 29, 2000·24 cites·4 claims
- 0551US6060374AMonitor for molecular nitrogen during silicon implantTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted May 9, 2000·16 cites·19 claims
- 0645US5863983AManufacturing method for blocked aqueous dispersion of polyurethanesCHINA TEXTILE INST·Filed 1997·Granted Jan 26, 1999·9 cites·9 claims
- 0740US6942764B1Arc-sprayed shield for pre-sputter etching chamberTAIWAN SEMICONDUCTOR MFG·Filed 1995·Granted Sep 13, 2005·5 cites·8 claims
- 0840US6577926B1Method of detecting and controlling in-situ faults in rapid thermal processing systemsTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jun 10, 2003·13 cites·14 claims
- 0936US6342135B1Sputter etching chamber with improved uniformityTAIWAN SEMICONDUCTOR MFG·Filed 1995·Granted Jan 29, 2002·3 cites·6 claims
- 1034US6436253B1Sputter etching chamber with improved uniformityTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Aug 20, 2002·3 cites·5 claims
- 1132US6358761B1Silicon monitor for detection of H2O2 in acid bathTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Mar 19, 2002·6 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →