Inventor · disambiguated record
Chi-Lun Lu
Also filed as: LU CHI-LUN
39 granted patents·4 pending applications·83 citations·filing 2003–2025
96Inventor score
Top patents by PatentIndex Score
43 records- 0195US7383530B2System and method for examining mask pattern fidelityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 3, 2008·27 cites·12 claims
- 0290US10459353B2Lithography system with an embedded cleaning moduleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 29, 2019·5 cites·20 claims
- 0390US8227150B2Holographic reticle and patterning methodCHANG SHIH-MING·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 0489US7883601B2Apparatus and method for controlling relative particle speeds in a plasmaTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Feb 8, 2011·8 cites·20 claims
- 0586US7897008B2Apparatus and method for regional plasma controlTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Mar 1, 2011·6 cites·18 claims
- 0685US2025314956A1Reflective masks and methods of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0783US11003069B2High durability extreme ultraviolet photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 11, 2021·1 cites·20 claims
- 0881US12493237B2EUV pellicle and mounting method thereof on photo maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 9, 2025·0 cites·20 claims
- 0980US9046781B2Structure and method for reflective-type maskTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 2, 2015·2 cites·20 claims
- 1079US10067418B2Particle removal system and method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 4, 2018·2 cites·20 claims
- 1179US2025244661A1Methods for cleaning lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1276US12276906B2Methods for cleaning lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·20 claims
- 1374US8282850B2Apparatus and method for controlling relative particle concentrations in a plasmaCHANG SHIH MING·Filed 2007·Granted Oct 9, 2012·2 cites·15 claims
- 1474US7819980B2System and method for removing particles in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Oct 26, 2010·4 cites·19 claims
- 1572US10520805B2System and method for localized EUV pellicle glue removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 31, 2019·1 cites·20 claims
- 1672US9418847B2Lithography system and method for haze eliminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 16, 2016·2 cites·20 claims
- 1771US12353120B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 8, 2025·0 cites·20 claims
- 1871US9885952B2Systems and methods of EUV mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 6, 2018·1 cites·20 claims
- 1971US7759136B2Critical dimension (CD) control by spectrum metrologyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 20, 2010·4 cites·16 claims
- 2070US11822230B2EUV pellicle and mounting method thereof on photo maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 21, 2023·0 cites·20 claims
- 2170US9665000B1Method and system for EUV mask cleaning with non-thermal solutionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 30, 2017·1 cites·20 claims
- 2270US8758963B2Holographic reticle and patterning methodCHANG SHIH-MING·Filed 2012·Granted Jun 24, 2014·1 cites·20 claims
- 2369US9889477B2Method and apparatus for enhanced cleaning and inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 13, 2018·1 cites·20 claims
- 2466US10156784B2Systems and methods of EUV mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 18, 2018·0 cites·20 claims
- 2565US11378894B2Lithography system with an embedded cleaning moduleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 5, 2022·0 cites·20 claims
- 2665US10642148B2High durability extreme ultraviolet photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 5, 2020·0 cites·20 claims
- 2763US11079669B2System and method for localized EUV pellicle glue removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·0 cites·20 claims
- 2863US7697114B2Method and apparatus for compensated illumination for advanced lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Apr 13, 2010·1 cites·26 claims
- 2959US10061191B2High durability extreme ultraviolet photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 28, 2018·0 cites·20 claims
- 3058US8888948B2Apparatus and method for controlling relative particle concentrations in a plasmaTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Nov 18, 2014·0 cites·20 claims
- 3158US7722997B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 25, 2010·0 cites·13 claims
- 3257US7312021B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Dec 25, 2007·3 cites·15 claims
- 3357US7060400B2Method to improve photomask critical dimension uniformity and photomask fabrication processTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 13, 2006·5 cites·26 claims
- 3456US9612523B2Structure and method for reflective-type maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 4, 2017·0 cites·20 claims
- 3555US8932958B2Device manufacturing and cleaning methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 13, 2015·0 cites·20 claims
- 3649US9138785B2Method and apparatus for enhanced cleaning and inspectionLU CHI-LUN·Filed 2012·Granted Sep 22, 2015·0 cites·19 claims
- 3748US8046860B2System and method for removing particles in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Nov 1, 2011·0 cites·20 claims
- 3846US9740094B2Damage prevention on EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 22, 2017·0 cites·20 claims
- 3946US8598042B1Device manufacturing and cleaning methodLU CHI-LUN·Filed 2012·Granted Dec 3, 2013·0 cites·20 claims
- 4046US7316872B2Etching bias reductionTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jan 8, 2008·0 cites·13 claims
- 4143US7460251B2Dimension monitoring method and systemTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Dec 2, 2008·0 cites·18 claims
- 4241US2004225488A1System and method for examining mask pattern fidelityFiled 2003·Application pending·0 cites
- 4337US2004265704A1Multiple-exposure defect eliminationTAIWAN SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →