Inventor · disambiguated record
Chen-Hsiang Lu
Also filed as: LU CHEN-HSIANG
24 granted patents·6 pending applications·99 citations·filing 2013–2024
94Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD30
Top patents by PatentIndex Score
30 records- 0198US9553090B2Structure and formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 24, 2017·30 cites·20 claims
- 0297US9899271B2Structure and formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 20, 2018·17 cites·20 claims
- 0397US9559205B2Structure and formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 31, 2017·23 cites·20 claims
- 0496US9450099B1Structure and formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 20, 2016·17 cites·20 claims
- 0592US10326005B2Structure and formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 18, 2019·4 cites·20 claims
- 0690US9679850B2Method of fabricating semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 13, 2017·5 cites·20 claims
- 0786US10686059B2Structure of semiconductor device structure having finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 16, 2020·2 cites·18 claims
- 0880US2024384401A1Multilayer ald coating for critical components in process chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0974US12275832B2Fluorine-containing elastomer composition and method for making cured fluorine-containing elastomer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·20 claims
- 1074US12049697B2Multilayer ALD coating for critical components in process chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 30, 2024·0 cites·20 claims
- 1174US11682716B2Structure of semiconductor device structure having finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 20, 2023·0 cites·20 claims
- 1269US10686060B2Structure and formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 16, 2020·0 cites·20 claims
- 1365US12283526B2Edge fin trim processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 22, 2025·0 cites·20 claims
- 1464US10867921B2Semiconductor structure with tapered conductorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·0 cites·20 claims
- 1563US10014394B2Structure and formation method of semiconductor device with metal gateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 3, 2018·0 cites·20 claims
- 1662US2022375729A1Plasma etcher edge ring with a chamfer geometry and impedance designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 1759US2024060173A1System for processing semiconductor device, method for forming semiconductor device, and method for forming protective structure on chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 1858US10304774B2Semiconductor structure having tapered damascene aperture and method of the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 28, 2019·0 cites·20 claims
- 1958US9177875B2Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Nov 3, 2015·1 cites·20 claims
- 2057US11404250B2Plasma etcher edge ring with a chamfer geometry and impedance designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·0 cites·20 claims
- 2156US2025022690A1Ring of an edge ring assembly for an etching systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 2254US9812549B2Formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·0 cites·20 claims
- 2352US9842765B2Semiconductor device structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 12, 2017·0 cites·20 claims
- 2452US2024010566A1Ceramic article, semiconductor apparatus for manufacturing a semiconductor structure and method of manufacturing a ceramic articleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 2550US9892957B2Semiconductor device structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 13, 2018·0 cites·17 claims
- 2649US2024014029A1Method of removing a by-product from a component of a semiconductor apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 2746US9087793B2Method for etching target layer of semiconductor device in etching apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jul 21, 2015·0 cites·20 claims
- 2841US9613816B2Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 4, 2017·0 cites·18 claims
- 2938US9704714B2Method for controlling surface charge on wafer surface in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 11, 2017·0 cites·21 claims
- 3036US10276469B2Method for forming semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 30, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →