Inventor · disambiguated record
Christie R. K. Marrian
Also filed as: MARRIAN CHRISTIE · MARRIAN CHRISTIE R · MARRIAN CHRISTIE R K · MARRIAN CHRISTIE RODERICK KING
21 granted patents·767 citations·filing 1983–2016
95Inventor score
Top patents by PatentIndex Score
21 records- 0198US5079600AHigh resolution patterning on solid substratesSCHNUR JOEL M·Filed 1988·Granted Jan 7, 1992·391 cites·34 claims
- 0293US5077085AHigh resolution metal patterning of ultra-thin films on solid substratesSCHNUR JOEL M·Filed 1987·Granted Dec 31, 1991·131 cites·12 claims
- 0390US7009694B2Indirect switching and sensing of phase change memory cellsIBM·Filed 2004·Granted Mar 7, 2006·40 cites·57 claims
- 0489US6017658ALithographic mask and method for fabrication thereofUS NAVY·Filed 1992·Granted Jan 25, 2000·72 cites·8 claims
- 0576US7682866B2Non-planarized, self-aligned, non-volatile phase-change memory array and method of formationIBM·Filed 2006·Granted Mar 23, 2010·4 cites·20 claims
- 0675US7038231B2Non-planarized, self-aligned, non-volatile phase-change memory array and method of formationIBM·Filed 2004·Granted May 2, 2006·15 cites·36 claims
- 0766US5504338AApparatus and method using low-voltage and/or low-current scanning probe lithographyUS ARMY·Filed 1993·Granted Apr 2, 1996·19 cites·20 claims
- 0864US5825040ABright beam method for super-resolution in e-beam lithographyUS NAVY·Filed 1996·Granted Oct 20, 1998·17 cites·9 claims
- 0957US10147877B2Method of forming controllably conductive oxideCYPRESS SEMICONDUCTOR CORP·Filed 2016·Granted Dec 4, 2018·0 cites·5 claims
- 1057US5113367ACross entropy deconvolver circuit adaptable to changing convolution functionsUS NAVY·Filed 1990·Granted May 12, 1992·18 cites·5 claims
- 1156US5336892AMethod and system for electron beam lithographyUS ARMY·Filed 1992·Granted Aug 9, 1994·18 cites·13 claims
- 1255US7038204B2Method for reducing proximity effects in electron beam lithographyIBM·Filed 2004·Granted May 2, 2006·2 cites·49 claims
- 1354US5703373AAlignment fiducial for improving patterning placement accuracy in e-beam masks for x-ray lithographyUS ARMY·Filed 1995·Granted Dec 30, 1997·11 cites·18 claims
- 1453US9461247B2Method of forming controllably conductive oxideCYPRESS SEMICONDUCTOR CORP·Filed 2015·Granted Oct 4, 2016·0 cites·20 claims
- 1548US8946020B2Method of forming controllably conductive oxideBUYNOSKI MATTHEW·Filed 2007·Granted Feb 3, 2015·0 cites·16 claims
- 1646US6392242B1Fiducial beam position monitorUS NAVY·Filed 1999·Granted May 21, 2002·7 cites·20 claims
- 1742US4849925AMaximum entropy deconvolver circuit based on neural net principlesUS NAVY·Filed 1988·Granted Jul 18, 1989·7 cites·6 claims
- 1833US5171608AMethod of pattern transfer in photolithography using laser induced metallizationUS NAVY·Filed 1990·Granted Dec 15, 1992·6 cites·20 claims
- 1932US5575888ASidewall passivation by oxidation during refractory-metal plasma etchingUS ARMY·Filed 1995·Granted Nov 19, 1996·7 cites·13 claims
- 2029US9274410B2Method and system for automated generation of masks for spacer formation from a desired final wafer patternLO WAI·Filed 2010·Granted Mar 1, 2016·0 cites·12 claims
- 2128US4492866AMethod for predicting the performance of cathode materialsUS NAVY·Filed 1983·Granted Jan 8, 1985·2 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →