Inventor · disambiguated record
Chihiro Okamoto
Also filed as: OKAMOTO CHIHIRO
15 granted patents·4 pending applications·38 citations·filing 1998–2025
88Inventor score
Top patents by PatentIndex Score
19 records- 0181US12186855B2Polishing pad, method for manufacturing polishing pad, and polishing methodKURARAY CO·Filed 2020·Granted Jan 7, 2025·1 cites·20 claims
- 0281US11787894B2Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing methodKURARAY CO·Filed 2020·Granted Oct 17, 2023·1 cites·20 claims
- 0375US9437446B2Slurry for chemical mechanical polishing and chemical mechanical polishing methodKURARAY CO·Filed 2013·Granted Sep 6, 2016·3 cites·15 claims
- 0471US2025236766A1Polyurethane for use in polishing layer, polishing layer, polishing pad, and method for modifying polishing layerKURARAY CO·Filed 2025·Application pending·0 cites
- 0566US6979701B2Thermoplastic polyurethane foam, process for production thereof and polishing pads made of the foamKURARAY CO·Filed 2001·Granted Dec 27, 2005·14 cites·16 claims
- 0660US12344702B2Polyurethane for polishing layer, polishing layer, and polishing padKURARAY CO·Filed 2019·Granted Jul 1, 2025·0 cites·19 claims
- 0757US12109665B2Modification method of polyurethane, polyurethane, polishing pad, and modification method of polishing padKURARAY CO·Filed 2019·Granted Oct 8, 2024·0 cites·18 claims
- 0855US12252634B2Polyurethane for polishing layers, polishing layer and polishing padKURARAY CO·Filed 2019·Granted Mar 18, 2025·0 cites·14 claims
- 0955US11053339B2Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing methodKURARAY CO·Filed 2018·Granted Jul 6, 2021·0 cites·1 claims
- 1055US2021380845A1Polyurethane for polishing layers, polishing layer, polishing pad and method for modifying polishing layerKURARAY CO·Filed 2019·Application pending·0 cites
- 1154US6429243B1Polyester resin compositionKURARAY CO·Filed 1998·Granted Aug 6, 2002·18 cites·32 claims
- 1252US9536752B2Slurry for chemical mechanical polishing and polishing method for substrate using sameTAKEGOSHI MINORI·Filed 2010·Granted Jan 3, 2017·1 cites·8 claims
- 1350US8308527B2Metal film polishing pad and method for polishing metal film using the sameKATO MITSURU·Filed 2008·Granted Nov 13, 2012·0 cites·22 claims
- 1448US11154960B2Polishing pad and polishing method using sameKURARAY CO·Filed 2017·Granted Oct 26, 2021·0 cites·11 claims
- 1545US2021207672A1Friction material and friction material compositionADVICS CO LTD·Filed 2019·Application pending·0 cites
- 1643US10625391B2Non-porous molded article for polishing layer, polishing pad, and polishing methodKURARAY CO·Filed 2015·Granted Apr 21, 2020·0 cites·13 claims
- 1741US10328548B2Polishing-layer molded body, and polishing padKURARAY CO·Filed 2015·Granted Jun 25, 2019·0 cites·12 claims
- 1837US9321142B2Polymer material, foam obtained from same, and polishing pad using thoseOKAMOTO CHIHIRO·Filed 2006·Granted Apr 26, 2016·0 cites·20 claims
- 1935US2014154884A1Erosion inhibitor for chemical mechanical polishing, slurry for chemical mechanical polishing, and chemical mechanical polishing methodKATO MITSURU·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →