Inventor · disambiguated record
Christopher F. Robinson
Also filed as: ROBINSON CHRISTOPHER · ROBINSON CHRISTOPHER F · ROBINSON CHRISTOPHER FREDERICK
24 granted patents·209 citations·filing 1996–2020
95Inventor score
Top patents by PatentIndex Score
24 records- 0192US6451510B1Developer/rinse formulation to prevent image collapse in resistIBM·Filed 2001·Granted Sep 17, 2002·68 cites·5 claims
- 0290US10642161B1Baseline overlay control with residual noise reductionIBM·Filed 2018·Granted May 5, 2020·5 cites·19 claims
- 0388US10274836B2Determination of lithography effective dose uniformityIBM·Filed 2017·Granted Apr 30, 2019·3 cites·13 claims
- 0481US8202460B2Microelectronic substrate having removable edge extension elementKOBURGER III CHARLES W·Filed 2005·Granted Jun 19, 2012·5 cites·9 claims
- 0579US7391023B2Lithography tool image quality evaluating and correctingIBM·Filed 2005·Granted Jun 24, 2008·4 cites·8 claims
- 0677US10281826B2Determination of lithography effective dose uniformityIBM·Filed 2017·Granted May 7, 2019·1 cites·7 claims
- 0774US7057715B2Lithography tool test patterns and methodIBM·Filed 2003·Granted Jun 6, 2006·11 cites·20 claims
- 0864US11561481B2Using E0 exposures for track/cluster monitoringIBM·Filed 2020·Granted Jan 24, 2023·0 cites·20 claims
- 0962US5712488AElectron beam performance measurement system and method thereofIBM·Filed 1996·Granted Jan 27, 1998·15 cites·20 claims
- 1059US5866913AProximity correction dose modulation for E-beam projection lithographyIBM·Filed 1997·Granted Feb 2, 1999·31 cites·28 claims
- 1159US5763894ACalibration patterns and techniques for charged particle projection lithography systemsIBM·Filed 1997·Granted Jun 9, 1998·14 cites·19 claims
- 1256US5751004AProjection reticle transmission control for coulomb interaction analysisIBM·Filed 1997·Granted May 12, 1998·12 cites·18 claims
- 1355US8946866B2Microelectronic substrate having removable edge extension elementKOBURGER III CHARLES W·Filed 2012·Granted Feb 3, 2015·0 cites·20 claims
- 1455US5936252ACharged particle beam performance measurement system and method thereofIBM·Filed 1997·Granted Aug 10, 1999·11 cites·22 claims
- 1554US11194254B2Lithography process delay characterization and effective dose compensationIBM·Filed 2019·Granted Dec 7, 2021·0 cites·20 claims
- 1650US10921716B1Lithographic dose characterizationIBM·Filed 2019·Granted Feb 16, 2021·0 cites·20 claims
- 1748US11402361B2Personnel-tolerant carbon dioxide beamline variation reductionIBM·Filed 2019·Granted Aug 2, 2022·0 cites·20 claims
- 1848US6573514B2Method for aligning electron beam projection lithography toolNIKON CORP·Filed 2001·Granted Jun 3, 2003·1 cites·11 claims
- 1948US6541783B1Stencil reticle incorporating scattering features for electron beam projection lithographyNIKON CORP·Filed 1999·Granted Apr 1, 2003·7 cites·30 claims
- 2048US6326634B1E-beam shape aperature incorporating lithographically defined heater elementIBM·Filed 1999·Granted Dec 4, 2001·7 cites·15 claims
- 2147US6262425B1Curvilinear axis set-up for charged particle lithographyIBM·Filed 1999·Granted Jul 17, 2001·7 cites·15 claims
- 2244US6931337B2Lithography tool image quality evaluating and correctingIBM·Filed 2003·Granted Aug 16, 2005·0 cites·14 claims
- 2341US6476400B1Method of adjusting a lithography system to enhance image qualityIBM·Filed 1999·Granted Nov 5, 2002·7 cites·14 claims
- 2439US6639219B2Electron scatter in a thin membrane to eliminate detector saturationIBM·Filed 2001·Granted Oct 28, 2003·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →