Inventor · disambiguated record
Chi Hyeong Roh
Also filed as: ROH CHI HYEONG
10 granted patents·2,061 citations·filing 1997–2003
93Inventor score
Top patents by PatentIndex Score
10 records- 0199US6225020B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 1, 2001·508 cites·20 claims
- 0298US6987155B2Polymers for photoresist and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 2003·Granted Jan 17, 2006·463 cites·15 claims
- 0398US6569971B2Polymers for photoresist and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 27, 2003·473 cites·5 claims
- 0498US6316162B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 13, 2001·482 cites·7 claims
- 0584US6150069AOxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 21, 2000·50 cites·18 claims
- 0675US6291131B1Monomers for photoresist, polymers thereof, and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Sep 18, 2001·18 cites·32 claims
- 0774US6316565B1Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the sameHYUNDAI ELECTRONICS IND·Filed 1997·Granted Nov 13, 2001·27 cites·4 claims
- 0873US6045967AMethod and device using ArF photoresistHYUNDAI ELECTRONICS IND·Filed 1998·Granted Apr 4, 2000·32 cites·20 claims
- 0967US6416926B1Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 9, 2002·8 cites·20 claims
- 1036US6602649B2Photoresist monomers, polymers thereof and photoresist compositions containing the sameHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Aug 5, 2003·0 cites·26 claims
Join the waitlist — get patent alerts
Get an alert when Chi Hyeong Roh files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →