Inventor · disambiguated record
Chandrasekhar Sarma
Also filed as: SARMA CHANDRASEKHAR
25 granted patents·5 pending applications·372 citations·filing 2003–2015
95Inventor score
Top patents by PatentIndex Score
30 records- 0198US7223612B2Alignment of MTJ stack to conductive lines in the absence of topographyINFINEON TECHNOLOGIES AG·Filed 2004·Granted May 29, 2007·280 cites·34 claims
- 0291US7687925B2Alignment marks for polarized light lithography and method for use thereofINFINEON TECHNOLOGIES AG·Filed 2005·Granted Mar 30, 2010·19 cites·17 claims
- 0385US7947431B2Lithography masks and methods of manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2010·Granted May 24, 2011·7 cites·19 claims
- 0480US8071261B2Lithography masks and methods of manufacture thereofGUTMANN ALOIS·Filed 2007·Granted Dec 6, 2011·6 cites·37 claims
- 0579US8359562B2System and method for semiconductor device fabrication using modelingINFINEON TECHNOLOGIES AG·Filed 2011·Granted Jan 22, 2013·5 cites·35 claims
- 0674US6933204B2Method for improved alignment of magnetic tunnel junction elementsIBM·Filed 2003·Granted Aug 23, 2005·21 cites·15 claims
- 0773US8715909B2Lithography systems and methods of manufacturing using thereofGUTMANN ALOIS·Filed 2007·Granted May 6, 2014·4 cites·23 claims
- 0871US8349528B2Semiconductor devices and methods of manufacturing thereofINFINEON TECHNOLOGIES AG·Filed 2011·Granted Jan 8, 2013·2 cites·18 claims
- 0970US7863130B2Tunable stressed polycrystalline silicon on dielectrics in an integrated circuitINFINEON TECHNOLOGIES AG·Filed 2007·Granted Jan 4, 2011·2 cites·18 claims
- 1070US7799486B2Lithography masks and methods of manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2006·Granted Sep 21, 2010·2 cites·30 claims
- 1169US8183129B2Alignment marks for polarized light lithography and method for use thereofMAROKKEY SAJAN·Filed 2010·Granted May 22, 2012·2 cites·27 claims
- 1269US7674350B2Feature dimension control in a manufacturing processINFINEON TECHNOLOGIES AG·Filed 2007·Granted Mar 9, 2010·2 cites·18 claims
- 1367US7666800B2Feature patterning methodsINFINEON TECHNOLOGIES AG·Filed 2008·Granted Feb 23, 2010·2 cites·24 claims
- 1466US7442624B2Deep alignment marks on edge chips for subsequent alignment of opaque layersINFINEON TECHNOLOGIES AG·Filed 2004·Granted Oct 28, 2008·15 cites·32 claims
- 1564US7794903B2Metrology systems and methods for lithography processesINFINEON TECHNOLOGIES AG·Filed 2006·Granted Sep 14, 2010·1 cites·15 claims
- 1662US8492079B2Method of forming a pattern of an array of shapes including a blocked regionCHEN CHIA-CHEN·Filed 2009·Granted Jul 23, 2013·1 cites·14 claims
- 1761US7713824B2Small feature integrated circuit fabricationINFINEON TECHNOLOGIES CORP·Filed 2007·Granted May 11, 2010·1 cites·12 claims
- 1853US8377800B2Alignment marks for polarized light lithography and method for use thereofINFINEON TECHNOLOGIES AG·Filed 2012·Granted Feb 19, 2013·0 cites·20 claims
- 1952US8394574B2Metrology systems and methods for lithography processesSARMA CHANDRASEKHAR·Filed 2011·Granted Mar 12, 2013·0 cites·24 claims
- 2051US8007985B2Semiconductor devices and methods of manufacturing thereofINFINEON TECHNOLOGIES AG·Filed 2006·Granted Aug 30, 2011·0 cites·18 claims
- 2150US7842579B2Method for manufacturing a semiconductor device having doped and undoped polysilicon layersINFINEON TECHNOLOGIES AG·Filed 2007·Granted Nov 30, 2010·0 cites·21 claims
- 2250US2015318394A1Tunable Stressed Polycrystalline Silicon on Dielectrics in an Integrated CircuitINFINEON TECHNOLOGIES AG·Filed 2015·Application pending·0 cites
- 2349US8067135B2Metrology systems and methods for lithography processesSARMA CHANDRASEKHAR·Filed 2010·Granted Nov 29, 2011·0 cites·7 claims
- 2448US9105747B2Tunable stressed polycrystalline silicon on dielectrics in an integrated circuitHIERLEMANN MATTHIAS·Filed 2010·Granted Aug 11, 2015·0 cites·11 claims
- 2547US8846462B2Transistor level routingOSTERMAYR MARTIN·Filed 2011·Granted Sep 30, 2014·0 cites·20 claims
- 2646US2009091729A1Lithography Systems and Methods of Manufacturing Using ThereofMAROKKEY SAJAN·Filed 2007·Application pending·0 cites
- 2746US2010120177A1Feature Dimension Control in a Manufacturing ProcessINFINEON TECHNOLOGIES AG·Filed 2010·Application pending·0 cites
- 2844US2015234272A1Metal oxide nanoparticles and photoresist compositionsINTEL CORP·Filed 2014·Application pending·0 cites
- 2943US8063406B2Semiconductor device having a polysilicon layer with a non-constant doping profileZHUANG HAOREN·Filed 2010·Granted Nov 22, 2011·0 cites·13 claims
- 3039US2007239305A1Process control systems and methodsZHUANG HAOREN·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →