Inventor · disambiguated record
Chih-Tsung Shih
Also filed as: SHIH CHIH-TSUNG
126 granted patents·28 pending applications·1,935 citations·filing 2003–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD123TAIWAN SEMICONDUCTOR MFG15IND TECH RES INST7CHIOU CHUNG-FAN3SHIH CHIH-TSUNG3
Top patents by PatentIndex Score
154 records- 0199US9184054B1Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Nov 10, 2015·786 cites·20 claims
- 0298US9869928B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·128 cites·20 claims
- 0398US9823585B2EUV focus monitoring systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 21, 2017·28 cites·20 claims
- 0498US9256123B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 9, 2016·365 cites·20 claims
- 0597US11086209B2EUV lithography mask with a porous reflective multilayer structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 10, 2021·7 cites·20 claims
- 0697US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 0797US8791024B1Method to define multiple layer patterns using a single exposureTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 29, 2014·31 cites·27 claims
- 0896US11809075B2EUV lithography mask with a porous reflective multilayer structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
- 0996US8865078B2Apparatus for single-molecule detectionCHIOU CHUNG-FAN·Filed 2010·Granted Oct 21, 2014·42 cites·52 claims
- 1095US12293954B2Method of fabricating semiconductor structure with heating elementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted May 6, 2025·1 cites·20 claims
- 1195US8865077B2Apparatus for single-molecule detectionCHIOU CHUNG-FAN·Filed 2010·Granted Oct 21, 2014·88 cites·3 claims
- 1293US12386119B2Facet profile to improve edge coupler beam pointing and coupling efficiency for photonicsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 12, 2025·2 cites·20 claims
- 1393US11448828B2Optical device for coupling lightTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 20, 2022·2 cites·20 claims
- 1492US7447387B2Electro-optical modulator with curving resonatorIND TECH RES INST·Filed 2006·Granted Nov 4, 2008·22 cites·16 claims
- 1591US11275301B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 15, 2022·3 cites·20 claims
- 1691US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 1790US10031411B2Pellicle for EUV mask and fabrication thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 24, 2018·3 cites·20 claims
- 1890US9081312B2Method to define multiple layer patterns with a single exposure by E-beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 14, 2015·7 cites·22 claims
- 1989US11774844B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 3, 2023·1 cites·20 claims
- 2089US10976674B2Method for detecting EUV pellicle ruptureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 13, 2021·3 cites·20 claims
- 2189US10276372B2Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·4 cites·20 claims
- 2288US11119420B2Particle prevention method in lithography exposure apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Sep 14, 2021·2 cites·20 claims
- 2388US9664999B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 2488US2024377720A1EUV Lithography Mask With A Porous Reflective Multilayer StructureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2587US10534279B1Methods and apparatus for removing contamination from lithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 14, 2020·2 cites·20 claims
- 2687US10366973B2Layout modification method for exposure manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 30, 2019·2 cites·20 claims
- 2787US2025093764A1Extreme ultraviolet maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2886US10642158B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 5, 2020·2 cites·20 claims
- 2986US8265436B2Bonding system for optical alignmentSHIH CHIH-TSUNG·Filed 2010·Granted Sep 11, 2012·15 cites·24 claims
- 3085US10007174B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 26, 2018·2 cites·20 claims
- 3185US9786602B2Interconnection structure and methods of fabrication the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 10, 2017·3 cites·20 claims
- 3284US12181791B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 3384US12072633B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 27, 2024·0 cites·20 claims
- 3484US9588419B2Extreme ultraviolet light (EUV) photomasks and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·2 cites·20 claims
- 3584US9316900B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Apr 19, 2016·3 cites·22 claims
- 3683US12510710B2Method for forming optical waveguide structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 30, 2025·0 cites·20 claims
- 3783US12216399B2Method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Feb 4, 2025·0 cites·20 claims
- 3883US11960116B2Optical waveguide couplerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 16, 2024·1 cites·20 claims
- 3983US11392022B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 19, 2022·1 cites·20 claims
- 4083US11003069B2High durability extreme ultraviolet photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 11, 2021·1 cites·20 claims
- 4183US10871713B2Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 22, 2020·1 cites·20 claims
- 4283US9777321B2Single molecule detection system and methodsIND TECH RES INST·Filed 2016·Granted Oct 3, 2017·2 cites·2 claims
- 4383US9134604B2Extreme ultraviolet (EUV) mask and method of fabricating the EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Sep 15, 2015·3 cites·20 claims
- 4483US2025314818A1Semiconductor package comprising optically coupled ic chipsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4583US2025239502A1Semiconductor structure with heating elementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4682US12298565B2Optical device for coupling light and method for fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 13, 2025·0 cites·20 claims
- 4782US12025918B2Method for lithography in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 2, 2024·0 cites·20 claims
- 4882US9709884B2EUV mask and manufacturing method by using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 18, 2017·2 cites·20 claims
- 4982US2025237817A1Optical device for coupling light and method for fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 5081US2024361533A1Two-dimensional grating coupler and methods of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 154 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →