Inventor · disambiguated record
Christoph Spengler
Also filed as: SPENGLER CHRISTOPH
11 granted patents·7 pending applications·63 citations·filing 2015–2024
87Inventor score
Top patents by PatentIndex Score
18 records- 0193US10522329B2Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatusIMS NANOFABRICATION GMBH·Filed 2018·Granted Dec 31, 2019·13 cites·14 claims
- 0293US9568907B2Correction of short-range dislocations in a multi-beam writerIMS NANOFABRICATION AG·Filed 2015·Granted Feb 14, 2017·18 cites·16 claims
- 0390US10651010B2Non-linear dose- and blur-dependent edge placement correctionIMS NANOFABRICATION GMBH·Filed 2019·Granted May 12, 2020·7 cites·10 claims
- 0489US11099482B2Adapting the duration of exposure slots in multi-beam writersIMS NANOFABRICATION GMBH·Filed 2020·Granted Aug 24, 2021·3 cites·15 claims
- 0588US10840054B2Charged-particle source and method for cleaning a charged-particle source using back-sputteringIMS NANOFABRICATION GMBH·Filed 2019·Granted Nov 17, 2020·7 cites·22 claims
- 0687US12040157B2Pattern data processing for programmable direct-write apparatusIMS NANOFABRICATION GMBH·Filed 2022·Granted Jul 16, 2024·2 cites·15 claims
- 0787US10325757B2Advanced dose-level quantization of multibeam-writersIMS NANOFABRICATION GMBH·Filed 2018·Granted Jun 18, 2019·9 cites·10 claims
- 0884US11735391B2Charged-particle sourceIMS NANOFABRICATION GMBH·Filed 2021·Granted Aug 22, 2023·2 cites·20 claims
- 0976US11569064B2Method for irradiating a target using restricted placement gridsIMS NANOFABRICATION GMBH·Filed 2018·Granted Jan 31, 2023·2 cites·22 claims
- 1059US2024427254A1Determination of Imaging Transfer Function of a Charged-Particle Exposure Apparatus Using Isofocal Dose MeasurementsIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 1159US2024304415A1Method for Determining Focal Properties in a Target Beam Field of a Multi-Beam Charged-Particle Processing ApparatusIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 1257US2023296989A1Correction of Thermal Expansion in a Lithographic DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 1354US2023360880A1Multi-Beam Pattern Definition DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 1453US2024212970A1Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagnetic ComponentsIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 1553US2024304413A1Optimizing Image Distortion in a Multi Beam Charged Particle Processing ApparatusIMS NANOFABRICATION GMBH·Filed 2024·Application pending·0 cites
- 1651US2023360878A1Adjustable Permanent Magnetic Lens Having Shunting DeviceIMS NANOFABRICATION GMBH·Filed 2023·Application pending·0 cites
- 1748US12481214B2Correction of blur variation in a multi-beam writerIMS NANOFABRICATION GMBH·Filed 2021·Granted Nov 25, 2025·0 cites·20 claims
- 1842US12500060B2Electromagnetic lensIMS NANOFABRICATION GMBH·Filed 2022·Granted Dec 16, 2025·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →