Inventor · disambiguated record
Chin-Yuan Tseng
Also filed as: TSENG CHIN · TSENG CHIN-YUAN
22 granted patents·5 pending applications·49 citations·filing 2011–2024
92Inventor score
Top patents by PatentIndex Score
27 records- 0196US9679994B1High fin cut fabrication processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 13, 2017·18 cites·20 claims
- 0294US10497565B2Method for forming semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 3, 2019·7 cites·20 claims
- 0391US9672320B2Method for integrated circuit manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 6, 2017·10 cites·20 claims
- 0489US9991132B2Lithographic technique incorporating varied pattern materialsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 5, 2018·5 cites·20 claims
- 0589US9449880B1Fin patterning methods for increased process marginTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 20, 2016·6 cites·20 claims
- 0681US11848208B2Method for forming semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 19, 2023·0 cites·20 claims
- 0779US10950456B2High-density semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 16, 2021·1 cites·20 claims
- 0878US10714485B2Semiconductor device which includes FinsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 14, 2020·1 cites·20 claims
- 0976US11616067B2Method of making semiconductor device which includes FinsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 28, 2023·0 cites·20 claims
- 1075US11437239B2Method for forming semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 6, 2022·0 cites·20 claims
- 1174US11532482B2High-density semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 1273US11222899B2Semiconductor device which includes fins and method of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 11, 2022·0 cites·20 claims
- 1370US2023247817A1Method of making semiconductor device which includes finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1468US2022367201A1Method of patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 1567US10971363B2Method for forming semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 6, 2021·0 cites·20 claims
- 1666US9530660B2Multiple directed self-assembly patterning processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 27, 2016·1 cites·20 claims
- 1764US11081354B2Fin patterning methods for increased process marginsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·0 cites·20 claims
- 1861US10957551B2Fin-like field effect transistor patterning methods for increasing process marginsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 23, 2021·0 cites·20 claims
- 1959US10446406B2High-density semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 15, 2019·0 cites·20 claims
- 2059US10074657B2Method of manufacturing fins and semiconductor device which includes finsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 11, 2018·0 cites·20 claims
- 2157US10312109B2Lithographic technique incorporating varied pattern materialsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 4, 2019·0 cites·20 claims
- 2256US10535520B2Fin patterning methods for increased process marginsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 14, 2020·0 cites·20 claims
- 2354US11901190B2Method of patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Feb 13, 2024·0 cites·19 claims
- 2453US10418252B2Fin-like field effect transistor patterning methods for increasing process marginsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 17, 2019·0 cites·20 claims
- 2547US2025142263A1Piezoelectric speaker and method for manufacturing the sameUNIV NAT TSING HUA·Filed 2024·Application pending·0 cites
- 2645US2011234365A1Chip resistor having low resistance and method for manufacturing the sameYAGEO CORP·Filed 2011·Application pending·0 cites
- 2743US2024397187A1System and method for tuning isp parametersMEDIATEK INC·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →