Inventor · disambiguated record
Chih-Chiang Tu
Also filed as: TU CHIH-CHIANG
74 granted patents·12 pending applications·513 citations·filing 1996–2024
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD52TAIWAN SEMICONDUCTOR MFG20TU CHIH-CHIANG8LIN CHIN-HSIANG2ONG BIOW-HIEM2
Top patents by PatentIndex Score
86 records- 0198US8812999B2Method and system of mask data preparation for curvilinear mask patterns for a deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 19, 2014·58 cites·19 claims
- 0297US12013632B2Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0396US11735421B2Reflection mode photomask and method of makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 22, 2023·2 cites·20 claims
- 0496US8715890B2Semiconductor mask blanks with a compatible stop layerTU CHIH-CHIANG·Filed 2012·Granted May 6, 2014·87 cites·10 claims
- 0595US11270884B2Reflection mode photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 8, 2022·3 cites·19 claims
- 0695US11143952B2Pellicle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 12, 2021·5 cites·20 claims
- 0795US9367661B2Apparatus and method for e-beam writingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 14, 2016·30 cites·20 claims
- 0891US8592102B2Cost-effective method for extreme ultraviolet (EUV) mask productionLIN CHIN-HSIANG·Filed 2009·Granted Nov 26, 2013·16 cites·13 claims
- 0990US9671685B2Lithographic plane check for mask processingLIN CHIN-HSIANG·Filed 2010·Granted Jun 6, 2017·8 cites·13 claims
- 1088US10095102B2Photomask having a plurality of shielding layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Oct 9, 2018·2 cites·20 claims
- 1188US9953833B2Semiconductor mask blanks with a compatible stop layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 24, 2018·4 cites·20 claims
- 1288US8563351B2Method for manufacturing photovoltaic deviceTU CHIH-CHIANG·Filed 2010·Granted Oct 22, 2013·5 cites·20 claims
- 1387US10553428B2Reflection mode photomask and fabrication method thereforeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Feb 4, 2020·3 cites·14 claims
- 1486US10845698B2Mask, method of forming the same and method of manufacturing a semiconductor device using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 24, 2020·3 cites·20 claims
- 1586US8133661B2Superimpose photomask and method of patterningCHANG HSIAO CHIH·Filed 2009·Granted Mar 13, 2012·19 cites·13 claims
- 1686US2024385507A1Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1785US12176211B2Reflection mode photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 1885US10276426B2System and method for performing spin dry etchingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 30, 2019·3 cites·20 claims
- 1985US9581894B2Image mask film scheme and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 28, 2017·2 cites·20 claims
- 2085US2024329517A1Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2184US12124163B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 22, 2024·0 cites·20 claims
- 2284US11662656B2Mask and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 30, 2023·1 cites·20 claims
- 2384US11402743B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·1 cites·20 claims
- 2483US8818072B2Rendered database image-to-inspection image optimization for inspectionONG BIOW-HIEM·Filed 2010·Granted Aug 26, 2014·10 cites·18 claims
- 2582US8981557B2Method for forming photovoltaic cell, and resulting photovoltaic cellTU CHIH-CHIANG·Filed 2012·Granted Mar 17, 2015·2 cites·11 claims
- 2681US12066757B2Mask and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 20, 2024·0 cites·20 claims
- 2781US2024377722A1Mask and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2880US11860530B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·0 cites·20 claims
- 2980US9122175B2Image mask film scheme and methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 1, 2015·2 cites·20 claims
- 3080US8901492B1Three-dimensional semiconductor image reconstruction apparatus and methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 2, 2014·4 cites·20 claims
- 3179US12487531B2Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 2, 2025·0 cites·20 claims
- 3278US11531263B2Photomask having a plurality of shielding layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 3378US10025175B2Method and system to prepare, manufacture and inspect mask patterns for a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jul 17, 2018·4 cites·20 claims
- 3478US9324178B2Three-dimensional semiconductor image reconstruction apparatus and methodTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Apr 26, 2016·3 cites·20 claims
- 3578US9063097B2Systems and methods eliminating false defect detectionsONG BIOW-HIEM·Filed 2011·Granted Jun 23, 2015·4 cites·5 claims
- 3678US8319962B2Mask making decision for manufacturing (DFM) on mask quality controlTU CHIH-CHIANG·Filed 2012·Granted Nov 27, 2012·2 cites·20 claims
- 3777US9921467B2Mask blank and mask and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 20, 2018·2 cites·20 claims
- 3877US9017903B2Mask overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 28, 2015·2 cites·20 claims
- 3977US8293645B2Method for forming photovoltaic cellTU CHIH-CHIANG·Filed 2010·Granted Oct 23, 2012·1 cites·20 claims
- 4076US8999611B2Mask blank for scattering effect reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 7, 2015·2 cites·20 claims
- 4176US5783337AProcess to fabricate a double layer attenuated phase shift mask (APSM) with chrome borderTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Jul 21, 1998·39 cites·22 claims
- 4275US5667919AAttenuated phase shift mask and method of manufacture thereofTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Sep 16, 1997·34 cites·18 claims
- 4374US11099476B2Photomask having a plurality of shielding layersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 24, 2021·0 cites·20 claims
- 4473US10274817B2Mask and photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·1 cites·13 claims
- 4572US10007176B2Graphene pellicle for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 26, 2018·1 cites·20 claims
- 4672US6311319B1Solving line-end shortening and corner rounding problems by using a simple checking ruleTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Oct 30, 2001·34 cites·15 claims
- 4770US9202947B2Photovoltaic deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Dec 1, 2015·0 cites·22 claims
- 4870US9142423B2Semiconductor mask blanks with a compatible stop layerTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Sep 22, 2015·1 cites·20 claims
- 4969US9377701B2Mask overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 28, 2016·1 cites·20 claims
- 5068US5858591AOptical proximity correction during wafer processing through subfile bias modification with subsequent subfile mergingTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Jan 12, 1999·28 cites·15 claims
Showing the top 50 of 86 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Chih-Chiang Tu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →