Inventor · disambiguated record
Chien-Yu Wang
Also filed as: WANG CHIEN-YU
8 granted patents·4 pending applications·11 citations·filing 2008–2025
76Inventor score
Top patents by PatentIndex Score
12 records- 0192US10111315B1Arc suppression device and arc suppression methodDELTA ELECTRONICS INC·Filed 2017·Granted Oct 23, 2018·8 cites·16 claims
- 0287US2025355371A1Integrated coupon design for surface coating qualityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0370US2024387147A1Cantilever with etch chamber flow designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0467US11875973B2Methods for preparing void-free coatings for plasma treatment componentsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 16, 2024·0 cites·20 claims
- 0562US2022375729A1Plasma etcher edge ring with a chamfer geometry and impedance designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 0661US8585480B2Shove board game system and playing method thereofWANG CHIEN-YU·Filed 2008·Granted Nov 19, 2013·3 cites·10 claims
- 0761US2023367339A1Methods for preparing void-free coatings for plasma treatment componentsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 0860US12184173B2Pulsed-DC power generator and method of automatically adjusting arc extinction parametersDELTA ELECTRONICS INC·Filed 2022·Granted Dec 31, 2024·0 cites·16 claims
- 0959US12400834B2Cantilever with etch chamber flow designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 26, 2025·0 cites·16 claims
- 1057US11404250B2Plasma etcher edge ring with a chamfer geometry and impedance designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·0 cites·20 claims
- 1149US11011989B2Power supply circuit and method of operation thereofDELTA ELECTRONICS INC·Filed 2020·Granted May 18, 2021·0 cites·20 claims
- 1246US11114934B2Power supply device and operation method thereofDELTA ELECTRONICS INC·Filed 2020·Granted Sep 7, 2021·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →