Inventor · disambiguated record
Chung S. Wang
Also filed as: WANG CHUNG S · WANG CHUNG-SHENG
10 granted patents·5 pending applications·256 citations·filing 1983–2024
91Inventor score
Files withVLSI TECHNOLOGY INC8VIRGILANT TECH LIMITED3TEXAS INSTRUMENTS INC2CHUNG WEI TECHNICAL SERVICE CO LTD1ETRON TECHNOLOGY INC1
Top patents by PatentIndex Score
15 records- 0177US5496751AMethod of forming an ESD and hot carrier resistant integrated circuit structureVLSI TECHNOLOGY INC·Filed 1995·Granted Mar 5, 1996·48 cites·16 claims
- 0276US5631485AESD and hot carrier resistant integrated circuit structureVLSI TECHNOLOGY INC·Filed 1995·Granted May 20, 1997·46 cites·17 claims
- 0371US5196357AMethod of making extended polysilicon self-aligned gate overlapped lightly doped drain structure for submicron transistorVLSI TECHNOLOGY INC·Filed 1991·Granted Mar 23, 1993·34 cites·20 claims
- 0467US2025121532A1Recycling Device And Method For Laminar Structures Bonded By Cured AdhesiveCHUNG WEI TECHNICAL SERVICE CO LTD·Filed 2024·Application pending·0 cites
- 0564US5411906AMethod of fabricating auxiliary gate lightly doped drain (AGLDD) structure with dielectric sidewallsVLSI TECHNOLOGY INC·Filed 1993·Granted May 2, 1995·25 cites·12 claims
- 0662US5340761ASelf-aligned contacts with gate overlapped lightly doped drain (goldd) structureVLSI TECHNOLOGY INC·Filed 1991·Granted Aug 23, 1994·23 cites·10 claims
- 0760US5444003AMethod and structure for creating a self-aligned bicmos-compatible bipolar transistor with a laterally graded emitter structureVLSI TECHNOLOGY INC·Filed 1993·Granted Aug 22, 1995·21 cites·26 claims
- 0857US5227320AMethod for producing gate overlapped lightly doped drain (goldd) structure for submicron transistorVLSI TECHNOLOGY INC·Filed 1991·Granted Jul 13, 1993·20 cites·9 claims
- 0952US5288652ABICMOS-compatible method for creating a bipolar transistor with laterally graded emitter structureVLSI TECHNOLOGY INC·Filed 1992·Granted Feb 22, 1994·15 cites·45 claims
- 1048US2021069433A1Electronic Inhaling DeviceVIRGILANT TECH LIMITED·Filed 2020·Application pending·0 cites
- 1147US4521446AMethod for depositing polysilicon over TiO2TEXAS INSTRUMENTS INC·Filed 1983·Granted Jun 4, 1985·13 cites·9 claims
- 1245US2014075103A1Method capable of increasing performance of a memory and related memory systemETRON TECHNOLOGY INC·Filed 2013·Application pending·0 cites
- 1343US4574177APlasma etch method for TiO2TEXAS INSTRUMENTS INC·Filed 1984·Granted Mar 4, 1986·11 cites·14 claims
- 1440US2017361036A1Electronic inhaling deviceVIRGILANT TECH LIMITED·Filed 2017·Application pending·0 cites
- 1533US2019111222A1Device for measuring breathing capacity/counting inhalationVIRGILANT TECH LIMITED·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →