Inventor · disambiguated record
Charles A. Whiting
Also filed as: WHITING CHARLES A · WHITING CHARLES ARTHUR
17 granted patents·1 pending application·537 citations·filing 1994–2005
95Inventor score
Files withIBM18
Top patents by PatentIndex Score
18 records- 0191US6735492B2Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settingsIBM·Filed 2002·Granted May 11, 2004·61 cites·32 claims
- 0290US5712078AHigh contrast photoresists comprising acid sensitive crosslinked polymeric resinsIBM·Filed 1995·Granted Jan 27, 1998·79 cites·8 claims
- 0388US6100506AHot plate with in situ surface temperature adjustmentIBM·Filed 1999·Granted Aug 8, 2000·123 cites·18 claims
- 0485US6342735B1Dual use alignment aidIBM·Filed 1999·Granted Jan 29, 2002·84 cites·22 claims
- 0580US6518679B2Capacitive alignment structure and method for chip stackingIBM·Filed 2000·Granted Feb 11, 2003·30 cites·20 claims
- 0680US6377334B2Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafersIBM·Filed 2001·Granted Apr 23, 2002·16 cites·5 claims
- 0777US6278515B1Method and apparatus for adjusting a tilt of a lithography toolIBM·Filed 2000·Granted Aug 21, 2001·16 cites·18 claims
- 0876US5783309ARecovery of an anodically bonded glass device from a substrate by use of a metal interlayerIBM·Filed 1996·Granted Jul 21, 1998·32 cites·10 claims
- 0975US6694498B2Feed-forward lithographic overlay offset method and systemIBM·Filed 2001·Granted Feb 17, 2004·15 cites·20 claims
- 1070US6412666B1Fluid container with a keying means to prevent improper fluid loading in a fluid delivery tool and a system including such fluid container and fluid delivery toolIBM·Filed 2001·Granted Jul 2, 2002·26 cites·20 claims
- 1163US6235439B1Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafersIBM·Filed 1999·Granted May 22, 2001·19 cites·5 claims
- 1258US5716763ALiquid immersion heating process for substrate temperature uniformityIBM·Filed 1994·Granted Feb 10, 1998·15 cites·27 claims
- 1356US6606533B1Method and arrangement for controlling image size of integrated circuits on wafers through post-exposure bake hotplate-specific dose feedbackIBM·Filed 2000·Granted Aug 12, 2003·6 cites·8 claims
- 1455US6674516B2Method of photolithographic exposure dose control as a function of resist sensitivityIBM·Filed 2002·Granted Jan 6, 2004·4 cites·7 claims
- 1554US6968288B2Method for detection of photolithographic defocusIBM·Filed 2003·Granted Nov 22, 2005·5 cites·30 claims
- 1642US5538151ARecovery of an anodically bonded glass device from a susstrate by use of a metal interlayerIBM·Filed 1995·Granted Jul 23, 1996·6 cites·9 claims
- 1740US6856378B2Method of photolithographic exposure dose control as a function of resist sensitivityIBM·Filed 2003·Granted Feb 15, 2005·0 cites·11 claims
- 1839US2006204859A1An extra dose trim mask, method of manufacture, and lithographic process using the sameIBM·Filed 2005·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Charles A. Whiting files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →