Inventor · disambiguated record
Chul-Kyu Yang
Also filed as: YANG CHUL-KYU
16 granted patents·10 pending applications·6 citations·filing 2012–2024
86Inventor score
Files withS&S TECH CO LTD26
Top patents by PatentIndex Score
26 records- 0184US11940725B2Phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2021·Granted Mar 26, 2024·1 cites·34 claims
- 0279US9851632B2Phase-shift blankmask and photomaskS&S TECH CO LTD·Filed 2015·Granted Dec 26, 2017·2 cites·17 claims
- 0379US9229317B2Blankmask and method for fabricating photomask using the sameS&S TECH CO LTD·Filed 2013·Granted Jan 5, 2016·3 cites·17 claims
- 0465US11579521B2Reflective type blankmask and photomask for EUVS&S TECH CO LTD·Filed 2021·Granted Feb 14, 2023·0 cites·19 claims
- 0563US11360377B2Half-tone attenuated phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2020·Granted Jun 14, 2022·0 cites·13 claims
- 0662US11467485B2Blankmask and photomask for extreme ultraviolet lithographyS&S TECH CO LTD·Filed 2020·Granted Oct 11, 2022·0 cites·26 claims
- 0762US2025231473A1Reverse photomask that phase shift film pattern is used for reflective pattern, and blankmask for manufacturing the sameS&S TECH CO LTD·Filed 2024·Application pending·0 cites
- 0861US11927880B2Phase shift blankmask and photomask for EUV lithographyS&S TECH CO LTD·Filed 2022·Granted Mar 12, 2024·0 cites·38 claims
- 0961US2025123551A1PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM OF CrSbS&S TECH CO LTD·Filed 2024·Application pending·0 cites
- 1058US11815801B2Reflective type blankmask and photomask for EUVS&S TECH CO LTD·Filed 2021·Granted Nov 14, 2023·0 cites·18 claims
- 1158US11435661B2Reflective type blankmask for EUV, and method for manufacturing the sameS&S TECH CO LTD·Filed 2020·Granted Sep 6, 2022·0 cites·18 claims
- 1258US10942445B2Blankmask and photomask, and methods of fabricating the sameS&S TECH CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·7 claims
- 1358US2024329516A1Phase shift blankmask and photomask for euv lithographyS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 1457US2024329515A1Blankmask for euv lithography with absorbing film, and photomask fabricated with the sameS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 1555US2024126163A1Phase shift blankmask and photomask for euv lithographyS&S TECH CO LTD·Filed 2023·Application pending·0 cites
- 1654US9482940B2Blankmask and photomaskS&S TECH CO LTD·Filed 2014·Granted Nov 1, 2016·0 cites·12 claims
- 1752US8846276B2Blankmask and photomask using the sameS&S TECH CO LTD·Filed 2012·Granted Sep 30, 2014·0 cites·20 claims
- 1849US9389500B2Mask blank, photomask, and method for manufacturing sameS&S TECH CO LTD·Filed 2012·Granted Jul 12, 2016·0 cites·13 claims
- 1948US10036947B2Blankmask and photomask using the sameS&S TECH CO LTD·Filed 2015·Granted Jul 31, 2018·0 cites·29 claims
- 2045US9551925B2Blankmask and photomask using the sameS&S TECH CO LTD·Filed 2015·Granted Jan 24, 2017·0 cites·13 claims
- 2144US10018905B2Phase shift blankmask and photomaskS&S TECH CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·15 claims
- 2244US2020379337A1Blankmask and photomaskS&S TECH CO LTD·Filed 2020·Application pending·0 cites
- 2344US2022075258A1Blankmask and photomaskS&S TECH CO LTD·Filed 2019·Application pending·0 cites
- 2440US2018335691A1Phase-shift blankmask and method of fabricating the sameS&S TECH CO LTD·Filed 2018·Application pending·0 cites
- 2539US2018335692A1Phase-shift blankmask and phase-shift photomaskS&S TECH CO LTD·Filed 2018·Application pending·0 cites
- 2637US2022066310A1Blankmask with backside conductive layer, and photomask manufactured with the sameS&S TECH CO LTD·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →