Inventor · disambiguated record
Clement Wann
Also filed as: WANN CLEMENT · WANN CLEMENT H
16 granted patents·2 pending applications·308 citations·filing 2003–2008
94Inventor score
Top patents by PatentIndex Score
18 records- 0198US7791109B2Metal silicide alloy local interconnectIBM·Filed 2007·Granted Sep 7, 2010·109 cites·11 claims
- 0293US7132322B1Method for forming a SiGe or SiGeC gate selectively in a complementary MIS/MOS FET deviceIBM·Filed 2005·Granted Nov 7, 2006·27 cites·20 claims
- 0392US7067368B1Method for forming self-aligned dual salicide in CMOS technologiesIBM·Filed 2005·Granted Jun 27, 2006·17 cites·10 claims
- 0487US7098536B2Structure for strained channel field effect transistor pair having a member and a contact viaIBM·Filed 2004·Granted Aug 29, 2006·31 cites·14 claims
- 0586US6984564B1Structure and method to improve SRAM stability without increasing cell area or off currentIBM·Filed 2004·Granted Jan 10, 2006·39 cites·9 claims
- 0680US7122462B2Back end interconnect with a shaped interfaceINFINEON TECHNOLOGIES AG·Filed 2003·Granted Oct 17, 2006·25 cites·5 claims
- 0779US7271455B2Formation of fully silicided metal gate using dual self-aligned silicide processIBM·Filed 2004·Granted Sep 18, 2007·20 cites·9 claims
- 0878US7122472B2Method for forming self-aligned dual fully silicided gates in CMOS devicesIBM·Filed 2004·Granted Oct 17, 2006·23 cites·36 claims
- 0977US7112481B2Method for forming self-aligned dual salicide in CMOS technologiesIBM·Filed 2005·Granted Sep 26, 2006·5 cites·20 claims
- 1069US7785999B2Formation of fully silicided metal gate using dual self-aligned silicide processIBM·Filed 2007·Granted Aug 31, 2010·3 cites·11 claims
- 1163US7542330B2SRAM with asymmetrical pass gatesIBM·Filed 2007·Granted Jun 2, 2009·5 cites·20 claims
- 1256US8039331B2Opto-thermal annealing methods for forming metal gate and fully silicided gate-field effect transistorsIBM·Filed 2008·Granted Oct 18, 2011·0 cites·8 claims
- 1354US7064025B1Method for forming self-aligned dual salicide in CMOS technologiesIBM·Filed 2004·Granted Jun 20, 2006·4 cites·21 claims
- 1452US7410852B2Opto-thermal annealing methods for forming metal gate and fully silicided gate field effect transistorsIBM·Filed 2006·Granted Aug 12, 2008·0 cites·1 claims
- 1550US7282435B2Method of forming contact for dual liner productIBM·Filed 2006·Granted Oct 16, 2007·0 cites·17 claims
- 1649US7494915B2Back end interconnect with a shaped interfaceIBM·Filed 2006·Granted Feb 24, 2009·0 cites·7 claims
- 1744US2009256207A1Finfet devices from bulk semiconductor and methods for manufacturing the sameIBM·Filed 2008·Application pending·0 cites
- 1839US2007123042A1Methods to form heterogeneous silicides/germanides in cmos technologyIBM·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →