Inventor · disambiguated record
Cyril Vannuffel
Also filed as: VANNUFFEL CYRIL
2 granted patents·3 citations·filing 2013–2014
37Inventor score
Technology areasG03F
Files withCOMMISSARIAT ENERGIE ATOMIQUE2
Top patents by PatentIndex Score
2 records- 0168US9116433B2Double-mask photolithography method minimizing the impact of substrate defectsCOMMISSARIAT ENERGIE ATOMIQUE·Filed 2014·Granted Aug 25, 2015·3 cites·19 claims
- 0235US9329472B2Method for manufacturing EUV masks minimizing the impact of substrate defectsCOMMISSARIAT ENERGIE ATOMIQUE·Filed 2013·Granted May 3, 2016·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →