Inventor · disambiguated record
David A. Baldwin
Also filed as: BALDWIN DAVID A · BALDWIN DAVID ALAN
22 granted patents·8 pending applications·392 citations·filing 1984–2013
96Inventor score
Top patents by PatentIndex Score
30 records- 0193US6819871B1Multi-channel optical filter and multiplexer formed from stacks of thin-film layersWAVE INC 4·Filed 2001·Granted Nov 16, 2004·69 cites·22 claims
- 0292US5616179AProcess for deposition of diamondlike, electrically conductive and electron-emissive carbon-based filmsCOMMW SCIENT CORP·Filed 1993·Granted Apr 1, 1997·98 cites·34 claims
- 0387US6419803B1System and method for making thin-film structures using a stepped profile mask4WAVE INC·Filed 2001·Granted Jul 16, 2002·31 cites·8 claims
- 0486US8329002B1Thin films and methods and machines for forming the thin filmsGITHINJI ANTHONY·Filed 2009·Granted Dec 11, 2012·21 cites·66 claims
- 0583US6870164B1Pulsed operation of hall-current ion sourcesKAUFMAN & ROBINSON INC·Filed 2000·Granted Mar 22, 2005·20 cites·9 claims
- 0682US6419802B1System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrateFiled 2001·Granted Jul 16, 2002·20 cites·13 claims
- 0781US6402905B1System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrateWAVE INC 4·Filed 2001·Granted Jun 11, 2002·21 cites·7 claims
- 0879US6679976B2System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals4WAVE INC·Filed 2002·Granted Jan 20, 2004·16 cites·25 claims
- 0978US6402904B1System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signalWAVE INC 4·Filed 2001·Granted Jun 11, 2002·14 cites·4 claims
- 1072US6723209B2System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicalsWAVE INC 4·Filed 2002·Granted Apr 20, 2004·12 cites·32 claims
- 1170US6610179B2System and method for controlling deposition thickness using a mask with a shadow that varies with respect to a targetFiled 2001·Granted Aug 26, 2003·10 cites·3 claims
- 1267US6402900B1System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cubeWAVE INC 4·Filed 2001·Granted Jun 11, 2002·8 cites·12 claims
- 1366US6689255B2System and method for making thin-film structures using a stepped profile maskWAVE INC 4·Filed 2002·Granted Feb 10, 2004·6 cites·19 claims
- 1466US6402901B1System and method for performing sputter deposition using a spherical geometryWAVE INC 4·Filed 2001·Granted Jun 11, 2002·6 cites·20 claims
- 1565US6373364B1Electromagnet for thin-film processing with winding pattern for reducing skewCVC PRODUCTS INC·Filed 2000·Granted Apr 16, 2002·10 cites·29 claims
- 1661US6488821B2System and method for performing sputter deposition using a divergent ion beam source and a rotating substrateWAVE INC 4·Filed 2002·Granted Dec 3, 2002·4 cites·4 claims
- 1761US2013063863A1Insulator Based Upon One or More Dielectric StructuresTIMLER JOHN P·Filed 2012·Application pending·0 cites
- 1860US7316764B2System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signalWAVE INC 4·Filed 2004·Granted Jan 8, 2008·4 cites·5 claims
- 1960US6843891B2Apparatus for sputter depositionKAUFMAN & ROBINSON INC·Filed 2001·Granted Jan 18, 2005·4 cites·17 claims
- 2053US6682634B1Apparatus for sputter depositionKAUFMAN & ROBINSON INC·Filed 1999·Granted Jan 27, 2004·10 cites·1 claims
- 2145US7177506B2Method for forming an aligned optical sub-assemblyWAVE INC 4·Filed 2004·Granted Feb 13, 2007·4 cites·26 claims
- 2244US2002174832A1System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to an angular position of a rotating substrate4WAVE INC·Filed 2002·Application pending·0 cites
- 2342US2003078996A1EnsoBox clustered services architecture: techniques for enabling the creation of scalable, robust, and industrial strength internet services provider applianceENSOPORT INTERNETWORKS·Filed 2001·Application pending·0 cites
- 2442US2003074438A1Techniques for enabling an internet services provider to perform office operations and functionsENSOPORT INTERNETWORKS·Filed 2001·Application pending·0 cites
- 2541US2014049152A1Vacuum electron power tubeBALDWIN DAVID A·Filed 2013·Application pending·0 cites
- 2640US2002130040A1System and method for performing sputter deposition using a devergent ion beam source and a rotating substrateWAVE INC 4·Filed 2001·Application pending·0 cites
- 2735US2013162136A1Arc devices and moving arc couplesBALDWIN DAVID A·Filed 2012·Application pending·0 cites
- 2832US4617836ATransmission systems for tracked vehiclesSECR DEFENCE BRIT·Filed 1984·Granted Oct 21, 1986·3 cites·3 claims
- 2930US2003149746A1Ensobox: an internet services provider appliance that enables an operator thereof to offer a full range of internet servicesENSOPORT INTERNETWORKS·Filed 2001·Application pending·0 cites
- 3017USD452866SElectronics cabinet faceENSOPORT COM INC·Filed 2000·Granted Jan 8, 2002·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →