Inventor · disambiguated record
Daisuke Domon
Also filed as: DOMON DAISUKE
53 granted patents·1 pending application·193 citations·filing 2009–2019
98Inventor score
Top patents by PatentIndex Score
54 records- 0197US9645493B2Negative resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted May 9, 2017·11 cites·11 claims
- 0296US8470511B2Chemically amplified negative resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·16 cites·17 claims
- 0396US8361693B2Chemically amplified positive photoresist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·32 cites·10 claims
- 0495US10968175B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Apr 6, 2021·6 cites·18 claims
- 0595US8426108B2Chemically amplified positive resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Apr 23, 2013·13 cites·5 claims
- 0694US9720323B2Chemically amplified positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 1, 2017·11 cites·12 claims
- 0794US8288076B2Chemically amplified resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2010·Granted Oct 16, 2012·12 cites·15 claims
- 0892US9969829B2Polymer compound, negative resist composition, laminate, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2017·Granted May 15, 2018·3 cites·20 claims
- 0992US9904169B2Photomask blank, resist pattern forming process, and method for making photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 27, 2018·5 cites·13 claims
- 1092US9740098B2Chemically amplified negative resist composition using novel onium salt and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 22, 2017·5 cites·13 claims
- 1191US8632939B2Polymer, chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Jan 21, 2014·8 cites·12 claims
- 1289US9604921B2Sulfonium salt, resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2015·Granted Mar 28, 2017·5 cites·14 claims
- 1389US8835097B2Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning processDOMON DAISUKE·Filed 2012·Granted Sep 16, 2014·9 cites·28 claims
- 1487US8815491B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2012·Granted Aug 26, 2014·5 cites·4 claims
- 1586US9904172B2Shrink material and pattern forming processSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 27, 2018·2 cites·13 claims
- 1685US9436083B2Chemically-amplified negative resist composition and resist patterning process using the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Sep 6, 2016·3 cites·20 claims
- 1785US9023587B2Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted May 5, 2015·14 cites·9 claims
- 1884US9632417B2Shrink material and pattern forming processSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 25, 2017·3 cites·16 claims
- 1984US9500949B2Chemically-amplified positive resist composition and resist patterning process using the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 22, 2016·3 cites·20 claims
- 2084US9182670B2Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 10, 2015·3 cites·9 claims
- 2183US8361692B2Negative resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·4 cites·18 claims
- 2280US11548844B2Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 10, 2023·1 cites·10 claims
- 2379US10377842B2Polymer, negative resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Aug 13, 2019·1 cites·19 claims
- 2477US11429023B2Onium salt, negative resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Aug 30, 2022·1 cites·18 claims
- 2576US11048165B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Jun 29, 2021·1 cites·15 claims
- 2676US11036136B2Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jun 15, 2021·1 cites·12 claims
- 2774US8273830B2Deprotection method of protected polymerMASUNAGA KEIICHI·Filed 2010·Granted Sep 25, 2012·2 cites·7 claims
- 2873US10345700B2Negative-tone resist compositions and multifunctional polymers thereinIBM·Filed 2014·Granted Jul 9, 2019·1 cites·20 claims
- 2971US8389201B2Positive resist composition and pattern forming processTANAKA AKINOBU·Filed 2010·Granted Mar 5, 2013·2 cites·10 claims
- 3070US8603724B2Negative resist composition and patterning processTANAKA AKINOBU·Filed 2010·Granted Dec 10, 2013·2 cites·18 claims
- 3169US8951710B2Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 10, 2015·1 cites·4 claims
- 3268US8968979B2Positive resist composition and patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 3, 2015·2 cites·16 claims
- 3367US11500285B2Multifunctional polymersIBM·Filed 2018·Granted Nov 15, 2022·0 cites·9 claims
- 3467US8835096B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2012·Granted Sep 16, 2014·1 cites·4 claims
- 3567US8501942B2Polymerizable monomersDOMON DAISUKE·Filed 2011·Granted Aug 6, 2013·1 cites·2 claims
- 3666US8828645B2Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 9, 2014·1 cites·14 claims
- 3765US9709890B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Jul 18, 2017·1 cites·3 claims
- 3863US8557509B2Negative resist composition, patterning process, and testing process and preparation process of negative resist compositionTANAKA AKINOBU·Filed 2010·Granted Oct 15, 2013·1 cites·11 claims
- 3961US11124477B2Sulfonium compound, positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 21, 2021·0 cites·15 claims
- 4058USRE46765EChemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Mar 27, 2018·0 cites·4 claims
- 4157USRE46736EChemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 27, 2018·0 cites·4 claims
- 4256US10191372B2Polymer, positive resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Jan 29, 2019·0 cites·18 claims
- 4356US9535325B2Onium salt, chemically amplified positive resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 3, 2017·0 cites·7 claims
- 4454US9329476B2Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted May 3, 2016·0 cites·20 claims
- 4553US9285678B2Sulfonium salt, resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 15, 2016·0 cites·11 claims
- 4645US8685629B2Resist pattern forming processMASUNAGA KEIICHI·Filed 2012·Granted Apr 1, 2014·0 cites·8 claims
- 4744US11131926B2Resist composition and resist patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 28, 2021·0 cites·18 claims
- 4840US9944738B2Polymer compound, positive resist composition, laminate, and resist patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Apr 17, 2018·0 cites·20 claims
- 4939US8859181B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Oct 14, 2014·0 cites·10 claims
- 5039US8546060B2Chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Oct 1, 2013·0 cites·5 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →