Inventor · disambiguated record
David Gonzales
Also filed as: GONZALES DAVID · GONZALES DAVID B · GONZALES JR DAVID
10 granted patents·1 pending application·481 citations·filing 1990–2015
91Inventor score
Top patents by PatentIndex Score
11 records- 0195US6503839B2Endpoint stabilization for polishing processMICRON TECHNOLOGY INC·Filed 2001·Granted Jan 7, 2003·82 cites·31 claims
- 0294US6287879B1Endpoint stabilization for polishing processMICRON TECHNOLOGY INC·Filed 1999·Granted Sep 11, 2001·129 cites·14 claims
- 0391US5679169AMethod for post chemical-mechanical planarization cleaning of semiconductor wafersMICRON TECHNOLOGY INC·Filed 1995·Granted Oct 21, 1997·100 cites·23 claims
- 0489US5894852AMethod for post chemical-mechanical planarization cleaning of semiconductor wafersMICRON TECHNOLOGY INC·Filed 1997·Granted Apr 20, 1999·85 cites·23 claims
- 0582US6273101B1Method for post chemical-mechanical planarization cleaning of semiconductor wafersMICRON TECHNOLOGY INC·Filed 1999·Granted Aug 14, 2001·53 cites·7 claims
- 0672US6640816B2Method for post chemical-mechanical planarization cleaning of semiconductor wafersMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 4, 2003·14 cites·22 claims
- 0758US7045017B2Method for post chemical-mechanical planarization cleaning of semiconductor wafersMICRON TECHNOLOGY INC·Filed 2003·Granted May 16, 2006·5 cites·15 claims
- 0855US9776206B2Method for depositing high aspect ratio molecular structuresCANATU OY·Filed 2015·Granted Oct 3, 2017·0 cites·4 claims
- 0948US5163232ASemiconductor lead planarity checkerTEXAS INSTRUMENTS INC·Filed 1990·Granted Nov 17, 1992·13 cites·17 claims
- 1038US2003082867A1Endpoint stabilization for polishing processFiled 2002·Application pending·0 cites
- 1136US8951602B2Method for depositing high aspect ratio molecular structuresBROWN DAVID P·Filed 2007·Granted Feb 10, 2015·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →