Inventor · disambiguated record
David W. Keck
Also filed as: KECK DAVID A · KECK DAVID W
9 granted patents·1 pending application·241 citations·filing 1993–2003
91Inventor score
Files withADVANCED SILICON MATERIALS LLC4ADVANCED SILICON MATERIALS INC2DWYER INSTR2ADVANCED MICRO DEVICES INC1ADVANCED SILCON MATERIALS INC1
Top patents by PatentIndex Score
10 records- 0187US6544333B2Chemical vapor deposition system for polycrystalline silicon rod productionADVANCED SILICON MATERIALS LLC·Filed 2001·Granted Apr 8, 2003·35 cites·9 claims
- 0285US6221155B1Chemical vapor deposition system for polycrystalline silicon rod productionADVANCED SILICON MATERIALS LLC·Filed 1998·Granted Apr 24, 2001·76 cites·7 claims
- 0382US6749824B2Chemical vapor deposition system for polycrystalline silicon rod productionADVANCED SILICON MATERIALS LLC·Filed 2003·Granted Jun 15, 2004·24 cites·3 claims
- 0476US5478396AProduction of high-purity polycrystalline silicon rod for semiconductor applicationsADVANCED SILICON MATERIALS INC·Filed 1994·Granted Dec 26, 1995·31 cites·8 claims
- 0566US6676916B2Method for inducing controlled cleavage of polycrystalline silicon rodADVANCED SILICON MATERIALS LLC·Filed 2002·Granted Jan 13, 2004·13 cites·25 claims
- 0663US5545387AProduction of high-purity polycrystalline silicon rod for semiconductor applicationsADVANCED SILCON MATERIALS INC·Filed 1995·Granted Aug 13, 1996·21 cites·15 claims
- 0758US5352858AHermetically sealed snap switch assembly with pre-use backfilling optionDWYER INSTR·Filed 1993·Granted Oct 4, 1994·15 cites·4 claims
- 0854USRE36936EProduction of high-purity polycrystalline silicon rod for semiconductor applicationsADVANCED SILICON MATERIALS INC·Filed 1998·Granted Oct 31, 2000·15 cites·15 claims
- 0951US5357067ACam arrangement for use in rotary position indicatorsDWYER INSTR·Filed 1993·Granted Oct 18, 1994·11 cites·8 claims
- 1041US2004122973A1System and method for programming hyper transport routing tables on multiprocessor systemsADVANCED MICRO DEVICES INC·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →