Inventor · disambiguated record
Daewon Kwon
Also filed as: KWON DAEWON
7 granted patents·3 pending applications·47 citations·filing 2001–2018
80Inventor score
Top patents by PatentIndex Score
10 records- 0182US6519045B2Method and apparatus for measuring very thin dielectric film thickness and creating a stable measurement environmentRUDOLPH TECHNOLOGIES INC·Filed 2001·Granted Feb 11, 2003·36 cites·16 claims
- 0277US9627239B2Wafer surface 3-D topography mapping based on in-situ tilt measurements in chemical vapor deposition systemsVEECO INSTR INC·Filed 2015·Granted Apr 18, 2017·3 cites·20 claims
- 0375US9748113B2Method and apparatus for controlled dopant incorporation and activation in a chemical vapor deposition systemVEECO INSTR INC·Filed 2015·Granted Aug 29, 2017·2 cites·30 claims
- 0475US9085824B2Control of stray radiation in a CVD chamberTAS GURAY·Filed 2012·Granted Jul 21, 2015·1 cites·12 claims
- 0560US6934031B2Methods and apparatus for determining optical constants of semiconductors and dielectrics with interband statesRUDOLPH TECHNOLOGIES INC·Filed 2001·Granted Aug 23, 2005·4 cites·20 claims
- 0656US9448119B2Radiation thermometer using off-focus telecentric opticsTAS GURAY·Filed 2012·Granted Sep 20, 2016·1 cites·18 claims
- 0747US2006224631A1System and method for using graphic and text data of Korean American families to enhance Korean American networkingKWON DAEWON·Filed 2006·Application pending·0 cites
- 0838US2020083075A1System and method for metrology using multiple measurement techniquesVEECO INSTR INC·Filed 2018·Application pending·0 cites
- 0937US2018142356A1Thickness uniformity control for epitaxially-grown structures in a chemical vapor deposition systemVEECO INSTR INC·Filed 2017·Application pending·0 cites
- 1034US9976909B2Control of stray radiation in a CVD chamberVEECO INSTR INC·Filed 2015·Granted May 22, 2018·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →