Inventor · disambiguated record
Dae-Youp Lee
Also filed as: LEE DAE Y · LEE DAE-YOUP
16 granted patents·6 pending applications·164 citations·filing 1992–2020
93Inventor score
Files withSAMSUNG ELECTRONICS CO LTD11KIM BONG-CHEOL3XIA TAI XIN SEMICONDUCTOR QING DAO LTD2KIM DAE-JOUNG1KOREA KUMHO CHEMICAL CO LTD1
Top patents by PatentIndex Score
22 records- 0190US8227354B2Method of forming semiconductor device patternsKIM BONG-CHEOL·Filed 2009·Granted Jul 24, 2012·28 cites·18 claims
- 0289US8546258B2Method of fabricating metal contact using double patterning technology and device formed therebyKIM BONG-CHEOL·Filed 2012·Granted Oct 1, 2013·11 cites·15 claims
- 0382US5314978ACopolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyreneKUMHO PETROCHEM CO LTD·Filed 1992·Granted May 24, 1994·41 cites·6 claims
- 0481US6818480B2Method of forming a pattern of a semiconductor device and photomask thereforSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 16, 2004·26 cites·23 claims
- 0574US6571384B2Method of forming fine patterns on semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted May 27, 2003·19 cites·13 claims
- 0672US8384876B2Method of detecting reticle errorsSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Feb 26, 2013·3 cites·18 claims
- 0760US8361905B2Methods of forming patterns for semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jan 29, 2013·1 cites·10 claims
- 0856US6620690B2Method of fabricating flash memory device using self-aligned non-exposure pattern formation processSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 16, 2003·6 cites·27 claims
- 0953US6933247B2Method for forming a minute pattern and method for manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 23, 2005·6 cites·18 claims
- 1050US7083899B2Method for manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 1, 2006·4 cites·15 claims
- 1150US6841338B2Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratioSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jan 11, 2005·3 cites·55 claims
- 1249US11693307B2Reticle pod for preventing haze contamination and reticle stocker having the sameXIA TAI XIN SEMICONDUCTOR QING DAO LTD·Filed 2019·Granted Jul 4, 2023·0 cites·17 claims
- 1349US5523191APositive photoresist composition containing naphthoquinone diazide phosphazene esterification productKOREA KUMHO CHEMICAL CO LTD·Filed 1995·Granted Jun 4, 1996·7 cites·2 claims
- 1448US2021208516A1Reticle stage for preventing haze contamination and exposure apparatus having the sameXIA TAI XIN SEMICONDUCTOR QING DAO LTD·Filed 2020·Application pending·0 cites
- 1543US5667931APositive photoresist composition containing quinone diazide 5-triazine esterification compoundKOREA KUMHO PETROCHEM CO LTD·Filed 1996·Granted Sep 16, 1997·8 cites·2 claims
- 1641US8241820B2Photomask used in fabrication of semiconductor deviceKIM BONG-CHEOL·Filed 2010·Granted Aug 14, 2012·0 cites·11 claims
- 1740US2007004140A1Method of manufacturing a non-volatile semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1839US6673706B2Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jan 6, 2004·1 cites·20 claims
- 1939US2007063317A1Overlay key, method of forming the overlay key, semiconductor device including the overlay key and method of manufacturing the semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2039US2006118974A1Structure provided on an overlay region, overlay mark having the structure, and method of forming the overlay markKIM DAE-JOUNG·Filed 2005·Application pending·0 cites
- 2135US2002001975A1Method of generating a circuit pattern used for fabricating a semiconductor deviceFiled 2001·Application pending·0 cites
- 2234US2006003240A1Methods for adjusting light intensity for photolithography and related systemsSHIM WOO-SEOK·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →