Inventor · disambiguated record
David O. Melville
Also filed as: MELVILLE DAVID · MELVILLE DAVID O · MELVILLE DAVID O S · MELVILLE DAVID OSMOND
24 granted patents·5 pending applications·71 citations·filing 2005–2017
94Inventor score
Top patents by PatentIndex Score
29 records- 0194US9651856B2Source, target and mask optimization by incorporating contour based assessments and integration over process variationsIBM·Filed 2015·Granted May 16, 2017·5 cites·20 claims
- 0294US8266556B2Fracturing continuous photolithography masksLIU YING·Filed 2010·Granted Sep 11, 2012·11 cites·19 claims
- 0388US10789576B2Meeting management systemIBM·Filed 2016·Granted Sep 29, 2020·5 cites·18 claims
- 0488US8682634B2Analyzing a patterning process using a model of yieldBAGHERI SAEED·Filed 2012·Granted Mar 25, 2014·5 cites·20 claims
- 0587US8954898B2Source-mask optimization for a lithography processIBM·Filed 2013·Granted Feb 10, 2015·5 cites·16 claims
- 0684US8028254B2Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scaleIBM·Filed 2008·Granted Sep 27, 2011·7 cites·18 claims
- 0782US9395622B2Synthesizing low mask error enhancement factor lithography solutionsGLOBALFOUNDRIES INC·Filed 2014·Granted Jul 19, 2016·3 cites·17 claims
- 0879US9250535B2Source, target and mask optimization by incorporating countour based assessments and integration over process variationsIBM·Filed 2013·Granted Feb 2, 2016·2 cites·20 claims
- 0978US10095918B2System and method for interpreting interpersonal communicationIBM·Filed 2017·Granted Oct 9, 2018·3 cites·8 claims
- 1078US8539390B2Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edgeINOUE TADANOBU·Filed 2011·Granted Sep 17, 2013·3 cites·20 claims
- 1177US8537444B2System and method for projection lithography with immersed image-aligned diffractive elementGIL DARIO·Filed 2012·Granted Sep 17, 2013·3 cites·5 claims
- 1275US8959462B2Mask design method, program, and mask design systemIBM·Filed 2013·Granted Feb 17, 2015·2 cites·20 claims
- 1374US8880382B2Analyzing a patterning process using a model of yieldBAGHERI SAEED·Filed 2012·Granted Nov 4, 2014·3 cites·18 claims
- 1474US7969554B2Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional imagesIBM·Filed 2007·Granted Jun 28, 2011·4 cites·20 claims
- 1572US8453076B2Wavefront engineering of mask data for semiconductor device designINOUE TADANOBU·Filed 2010·Granted May 28, 2013·2 cites·20 claims
- 1671US8234603B2Method for fast estimation of lithographic binding patterns in an integrated circuit layoutBAGHERI SAEED·Filed 2010·Granted Jul 31, 2012·3 cites·25 claims
- 1770US8448098B2Fracturing continuous photolithography masksLIU YING·Filed 2012·Granted May 21, 2013·1 cites·20 claims
- 1861US9760766B2System and method for interpreting interpersonal communicationIBM·Filed 2015·Granted Sep 12, 2017·1 cites·11 claims
- 1960US8056023B2Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic maskIBM·Filed 2008·Granted Nov 8, 2011·1 cites·18 claims
- 2060US8056026B2Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic maskIBM·Filed 2008·Granted Nov 8, 2011·1 cites·19 claims
- 2159US8266554B2Dynamic provisional decomposition of lithographic patterns having different interaction rangesBAGHERI SAEED·Filed 2011·Granted Sep 11, 2012·1 cites·12 claims
- 2254US2010003605A1system and method for projection lithography with immersed image-aligned diffractive elementIBM·Filed 2008·Application pending·0 cites
- 2352US10169716B2Interactive learningIBM·Filed 2015·Granted Jan 1, 2019·0 cites·11 claims
- 2451US9857676B2Method and program product for designing source and mask for lithographyIBM·Filed 2014·Granted Jan 2, 2018·0 cites·20 claims
- 2545US2016283961A1System and method for cognitive computing incentive frameworkIBM·Filed 2015·Application pending·0 cites
- 2645US2016328987A1Detecting the mood of a groupIBM·Filed 2015·Application pending·0 cites
- 2745US2016328988A1Detecting the mood of a groupIBM·Filed 2015·Application pending·0 cites
- 2841US2006017333A1Optical scannerLOEBEL NICOLAS G·Filed 2005·Application pending·0 cites
- 2933US8719735B2Optimizing lithographic mask for manufacturability in efficient mannerSAKAMOTO MASAHARU·Filed 2011·Granted May 6, 2014·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →