Inventor · disambiguated record
Danping Peng
Also filed as: PENG DANPING
35 granted patents·7 pending applications·641 citations·filing 2003–2024
98Inventor score
Top patents by PatentIndex Score
42 records- 0197US11435670B1Multi-component kernels for vector optical image simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 6, 2022·3 cites·20 claims
- 0297US8056021B2Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2010·Granted Nov 8, 2011·31 cites·21 claims
- 0397US7992109B2Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2010·Granted Aug 2, 2011·29 cites·20 claims
- 0497US7984391B2Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2010·Granted Jul 19, 2011·29 cites·20 claims
- 0597US7757201B2Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2007·Granted Jul 13, 2010·40 cites·19 claims
- 0697US7707541B2Systems, masks, and methods for photolithographyLUMINESCENT TECHNOLOGIES INC·Filed 2006·Granted Apr 27, 2010·61 cites·24 claims
- 0797US7703049B2System, masks, and methods for photomasks optimized with approximate and accurate merit functionsLUMINESCENT TECHNOLOGIES INC·Filed 2006·Granted Apr 20, 2010·43 cites·8 claims
- 0897US7441227B2Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2006·Granted Oct 21, 2008·49 cites·22 claims
- 0997US7178127B2Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2005·Granted Feb 13, 2007·58 cites·22 claims
- 1096US10671786B2Method of modeling a mask by taking into account of mask pattern edge interactionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·7 cites·20 claims
- 1196US7805700B2Physical-resist model using fast sweepingLUMINESCENT TECHNOLOGIES INC·Filed 2007·Granted Sep 28, 2010·34 cites·22 claims
- 1296US7703068B2Technique for determining a mask pattern corresponding to a photo-maskLUMINESCENT TECHNOLOGIES INC·Filed 2007·Granted Apr 20, 2010·36 cites·24 claims
- 1396US7124394B1Method for time-evolving rectilinear contours representing photo masksLUMINESCENT TECHNOLOGIES INC·Filed 2003·Granted Oct 17, 2006·69 cites·16 claims
- 1495US7571423B2Optimized photomasks for photolithographyLUMINESCENT TECHNOLOGIES INC·Filed 2005·Granted Aug 4, 2009·51 cites·19 claims
- 1594US10466586B2Method of modeling a mask having patterns with arbitrary anglesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 5, 2019·5 cites·20 claims
- 1692US11754930B2Multi-component kernels for vector optical image simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 12, 2023·1 cites·20 claims
- 1792US10838305B2Lithographic mask correction using volume correction techniquesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 17, 2020·4 cites·19 claims
- 1890US10671052B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 2, 2020·5 cites·20 claims
- 1990US7480889B2Optimized photomasks for photolithographyLUMINESCENT TECHNOLOGIES INC·Filed 2003·Granted Jan 20, 2009·59 cites·11 claims
- 2089US11340584B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 24, 2022·2 cites·20 claims
- 2188US11143955B2Method of modeling a mask having patterns with arbitrary anglesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 12, 2021·2 cites·20 claims
- 2288US10990002B2Sub-resolution assist featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 27, 2021·3 cites·20 claims
- 2387US10915090B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 9, 2021·2 cites·20 claims
- 2486US11610043B2Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 21, 2023·1 cites·20 claims
- 2584US12153349B2Multi-component kernels for vector optical image simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 26, 2024·0 cites·20 claims
- 2684US8458622B2Photo-mask acceptance techniquePANG LINYONG·Filed 2010·Granted Jun 4, 2013·10 cites·20 claims
- 2784US2024370636A1Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2883US12416857B2Sub-resolution assist featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 16, 2025·0 cites·20 claims
- 2983US12056431B2Methods of preparing photo mask data and manufacturing a photo maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 6, 2024·1 cites·20 claims
- 3081US12112116B2Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 8, 2024·0 cites·20 claims
- 3181US7793253B2Mask-patterns including intentional breaksLUMINESCENT TECHNOLOGIES INC·Filed 2006·Granted Sep 7, 2010·6 cites·23 claims
- 3279US11747786B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 5, 2023·0 cites·20 claims
- 3376US11994796B2Method of modeling a mask having patterns with arbitrary anglesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 28, 2024·0 cites·20 claims
- 3473US2024362396A1Methods of preparing photo mask data and manufacturing a photo maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3572US2023274063A1Method of modeling a mask by taking into account of mask pattern edge interactionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3671US11829066B2Sub-resolution assist featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 28, 2023·0 cites·20 claims
- 3771US11645443B2Method of modeling a mask by taking into account of mask pattern edge interactionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 9, 2023·0 cites·20 claims
- 3868US11531273B2Lithographic mask correction using volume correction techniquesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 20, 2022·0 cites·20 claims
- 3961US2024003827A1Systems and methods for actinic mask inspection and review in vacuumTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4056US2025147411A1Method for optimizing photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4156US2024378327A1Material processing modelingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4242US2006172204A1Systems, masks and methods for printing contact holes and other patternsPENG DANPING·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →