Inventor · disambiguated record
Deog-Bae Kim
Also filed as: KIM DEOG-BAE
17 granted patents·492 citations·filing 2000–2011
91Inventor score
Top patents by PatentIndex Score
17 records- 0198US6924078B2Photoresist monomers, polymers and photoresist compositions for preventing acid diffusionDONGJIN SEMICHEM CO LTD·Filed 2002·Granted Aug 2, 2005·463 cites·17 claims
- 0275US7309561B2Polymer for forming anti-reflective coating layerDONGJIN SEMICHEM CO LTD·Filed 2006·Granted Dec 18, 2007·2 cites·9 claims
- 0373US7604919B2Monomer, polymer and composition for photoresistDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Oct 20, 2009·2 cites·9 claims
- 0473US7569325B2Monomer having sulfonyl group, polymer thereof and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Aug 4, 2009·3 cites·6 claims
- 0573US7368219B2Polymer for forming anti-reflective coating layerDONGJIN SEMICHEM CO LTD·Filed 2005·Granted May 6, 2008·2 cites·10 claims
- 0665US9063424B2Isocyanurate compound for forming organic anti-reflective layer and composition including sameROH HYO-JUNG·Filed 2010·Granted Jun 23, 2015·3 cites·4 claims
- 0765US7465531B2Polymer for forming anti-reflective coating layerDONGJIN SEMICHEM CO LTD·Filed 2006·Granted Dec 16, 2008·4 cites·9 claims
- 0861US7297463B2Photosensitive polymer and chemically amplified photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2005·Granted Nov 20, 2007·1 cites·7 claims
- 0961US6767687B1Polymer for chemically amplified resist and a resist composition using the sameDONGJIN SEMICHEM CO LTD·Filed 2000·Granted Jul 27, 2004·7 cites·5 claims
- 1058US8551684B2Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the compositionPARK JONG KYOUNG·Filed 2011·Granted Oct 8, 2013·1 cites·12 claims
- 1155US7282530B2Polymer for forming anti-reflective coating layerDONGJIN SEMICHEM CO LTD·Filed 2006·Granted Oct 16, 2007·2 cites·8 claims
- 1253US7745099B2Photosensitive compound and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2008·Granted Jun 29, 2010·0 cites·5 claims
- 1348US7504195B2Photosensitive polymer and photoresist compositionDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Mar 17, 2009·0 cites·12 claims
- 1448US7419761B2Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2005·Granted Sep 2, 2008·0 cites·13 claims
- 1548US6743881B2Chemically amplified resist and a resist compositionDONGJIN SEMICHEM CO LTD·Filed 2001·Granted Jun 1, 2004·2 cites·6 claims
- 1642US8293458B2Method for forming fine pattern in semiconductor deviceLEE JUN-GYEONG·Filed 2009·Granted Oct 23, 2012·0 cites·19 claims
- 1742US7344820B2Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the sameDONGJIN SEMICHEM CO LTD·Filed 2002·Granted Mar 18, 2008·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →