Inventor · disambiguated record
Dhei-Jhai Lin
Also filed as: LIN DHEI-JHAI
8 granted patents·133 citations·filing 1989–2003
88Inventor score
Top patents by PatentIndex Score
8 records- 0175US5718991AMethod for making photomasks having regions of different light transmissivitiesIND TECH RES INST·Filed 1996·Granted Feb 17, 1998·42 cites·20 claims
- 0263US5304453AMethod for preparing resist patterns through image layer transfer to a receiver substrate, via a photo-hardening organic liquid adhesive, with subsequent oxygen reactive ion etchingIND TECH RES INST·Filed 1993·Granted Apr 19, 1994·19 cites·12 claims
- 0363US5242780AElectrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groupsIND TECH RES INST·Filed 1991·Granted Sep 7, 1993·18 cites·8 claims
- 0462US5019483AAqueous developable photoresist containing weak alkali soluble or dispersible thiol compoundsIND TECH RES INST·Filed 1989·Granted May 28, 1991·15 cites·15 claims
- 0559US6989177B2Method for making a color filter including attaching a mold to a substrate and then filling with a photopolymer solutionPOLYOPTOCOM CORP·Filed 2003·Granted Jan 24, 2006·9 cites·10 claims
- 0651US5229245APositively working photosensitive compositionIND TECH RES INST·Filed 1991·Granted Jul 20, 1993·11 cites·7 claims
- 0746US5153102AAlkalline-solution-developable liquid photographic compositionIND TECH RES INST·Filed 1990·Granted Oct 6, 1992·13 cites·9 claims
- 0841US5275913AMethod for preparing resist patterns utilizing solvent development with subsequent resist pattern transfer, via a photo-hardening liquid adhesive, to a receiver substrate and oxygen reactive ion etchingIND TECH RES INST·Filed 1993·Granted Jan 4, 1994·6 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →