Inventor · disambiguated record

Ding-I Liu

Also filed as: LIU DING-I

46 granted patents·11 pending applications·55 citations·filing 2011–2025

96Inventor score

Technology areasH10P H10W C23C H10D H01J

Files withTAIWAN SEMICONDUCTOR MFG CO LTD46 TAIWAN SEMICONDUCTOR MFG3 WANG LAN-HAI2 CHANG JEN-CHI1 CHIANG CHIH-WEI1

Top patents by PatentIndex Score

57 records

0195US10533252B2Showerhead, semicondcutor processing apparatus having the same and semiconductor processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 14, 2020·10 cites·18 claims
0291US11315829B2Amorphous layers for reducing copper diffusion and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 26, 2022·2 cites·20 claims
0391US11264467B2Semiconductor device having multi-layer diffusion barrier and method of making the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 1, 2022·2 cites·20 claims
0490US2025357196A1Electron migration control in interconnect structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
0589US10161041B2Thermal chemical vapor deposition system and operating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·5 cites·18 claims
0685US12354908B2Amorphous layers for reducing copper diffusion and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 8, 2025·0 cites·20 claims
0785US2025293084A1Amorphous layers for reducing copper diffusion and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
0883US12020905B2Method of using high density plasma chemical vapor deposition chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
0983US9941100B2Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzleWU WEI CHING·Filed 2011·Granted Apr 10, 2018·3 cites·14 claims
1082US10749004B2Semiconductor device having a multi-layer diffusion barrierTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 18, 2020·2 cites·18 claims
1181US12444647B2Electron migration control in interconnect structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 14, 2025·0 cites·20 claims
1281US9716044B2Interlayer dielectric structure with high aspect ratio process (HARP)CHANG JEN-CHI·Filed 2011·Granted Jul 25, 2017·6 cites·20 claims
1380US10864530B2Coating apparatus and method of forming coating filmTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·3 cites·20 claims
1480US9607873B2Apparatus and operation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 28, 2017·6 cites·20 claims
1579US11967522B2Amorphous layers for reducing copper diffusion and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 23, 2024·0 cites·20 claims
1679US11194259B2Equipment module with enhanced protection from airborne contaminants, and method of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 7, 2021·3 cites·20 claims
1779US10867787B2Method for controlling plasma in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·2 cites·20 claims
1879US10626499B2Deposition device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 21, 2020·1 cites·20 claims
1979US9573144B2Coating apparatus and method of forming coating filmTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 21, 2017·4 cites·20 claims
2078US11342164B2High density plasma chemical vapor deposition chamber and method of usingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 24, 2022·0 cites·20 claims
2176US2024395609A1Method of manufacturing semiconductor device and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
2276US2024312792A1Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
2375US12354907B2Electron migration control in interconnect structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 8, 2025·0 cites·20 claims
2475US11742393B2Semiconductor device having a multi-layer diffusion barrier and method of making the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 29, 2023·0 cites·20 claims
2575US9490152B2Asymmetrical chamber configurationWANG LAN-HAI·Filed 2012·Granted Nov 8, 2016·5 cites·20 claims
2674US12148656B2Method of manufacturing semiconductor device and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 19, 2024·0 cites·20 claims
2772US12020947B2Method of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 25, 2024·0 cites·20 claims
2870US11264273B2Electron migration control in interconnect structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 1, 2022·0 cites·20 claims
2968US2024384404A1Semiconductor manufacturing apparatus with improved production yieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3063US11069534B2Method of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 20, 2021·0 cites·20 claims
3163US10910199B2Method of controlling an adjustable nozzle and method of making a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Feb 2, 2021·0 cites·20 claims
3261US11322397B2Method of manufacturing semiconductor devices including formation of adhesion enhancement layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 3, 2022·0 cites·20 claims
3360US8946095B2Method of forming interlayer dielectric film above metal gate of semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Feb 3, 2015·1 cites·20 claims
3455US2022333236A1Semiconductor manufacturing apparatus with improved production yieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
3555US2020203473A1Semiconductor device and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Application pending·0 cites
3654US10724140B2Thermal chemical vapor deposition system and operating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 28, 2020·0 cites·20 claims
3754US9831307B2Gap fill self planarization on post EPITAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 28, 2017·0 cites·20 claims
3852US9536771B2Gap fill self planarization on post EPITAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jan 3, 2017·0 cites·20 claims
3948US10867838B2Semiconductor device having a shallow trench isolation structure and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 15, 2020·0 cites·20 claims
4048US9631273B2Apparatus for dielectric deposition processWANG LAN-HAI·Filed 2012·Granted Apr 25, 2017·0 cites·19 claims
4148US9048185B2Profile pre-shaping for replacement poly gate interlayer dielectricTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 2, 2015·0 cites·20 claims
4247US10978337B2Aluminum-containing layers and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 13, 2021·0 cites·20 claims
4346US9953861B2Semiconductor device having a shallow trench isolation structure and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 24, 2018·0 cites·20 claims
4446US9209071B2Semiconductor structure with anti-etch structure in via and method for manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 8, 2015·0 cites·20 claims
4546US2013292791A1Semiconductor device and method for forming the sameLIN CHUN-LI·Filed 2012·Application pending·0 cites
4645US10395918B2Method and system for controlling plasma in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 27, 2019·0 cites·20 claims
4742US10164063B2Semiconductor structure with protection layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·0 cites·20 claims
4842US9324559B2Thin film deposition apparatus with multi chamber design and film deposition methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 26, 2016·0 cites·17 claims
4941US9607809B2High density plasma reactor with multiple top coilsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 28, 2017·0 cites·16 claims
5041US8884404B2Mechanism of patterning a semiconductor device and product resulting therefromLI YI-FANG·Filed 2012·Granted Nov 11, 2014·0 cites·20 claims

Showing the top 50 of 57 patent records by PatentIndex Score.

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →