Inventor · disambiguated record
Dongzhi Chi
Also filed as: CHI DONGZHI
8 granted patents·4 pending applications·53 citations·filing 2000–2021
81Inventor score
Top patents by PatentIndex Score
12 records- 0182US6531396B1Method of fabricating a nickel/platinum monsilicide filmINST MATERIALS RESEARCH & ENG·Filed 2000·Granted Mar 11, 2003·44 cites·13 claims
- 0280US9802821B2Method for preparing transition metal phosphideAGENCY SCIENCE TECH & RES·Filed 2016·Granted Oct 31, 2017·2 cites·18 claims
- 0357US12006569B2Method and arrangement for forming a transition metal dichalcogenide layerAGENCY SCIENCE TECH & RES·Filed 2020·Granted Jun 11, 2024·0 cites·8 claims
- 0456US11257663B2Sputtering system and methodAGENCY SCIENCE TECH & RES·Filed 2018·Granted Feb 22, 2022·0 cites·13 claims
- 0548US12480205B2Method of growing monolayer transition metal dichalcogenides via sulfurization and subsequent sublimationAGENCY SCIENCE TECH & RES·Filed 2021·Granted Nov 25, 2025·0 cites·18 claims
- 0646US7335606B2Silicide formed from ternary metal alloy filmsAGENCY SCIENCE TECH & RES·Filed 2004·Granted Feb 26, 2008·5 cites·9 claims
- 0744US12245531B2Resistive memory device structure based on stacked layers of nanocrystalline TMDCsAGENCY SCIENCE TECH & RES·Filed 2020·Granted Mar 4, 2025·0 cites·19 claims
- 0842US2021027924A1Soft magnetic compositesAGENCY SCIENCE TECH & RES·Filed 2019·Application pending·0 cites
- 0941US2018105459A1A multilayer coatingAGENCY SCIENCE TECH & RES·Filed 2016·Application pending·0 cites
- 1040US7419905B2Gate electrodes and the formation thereofAGENCY SCIENCE TECH & RES·Filed 2004·Granted Sep 2, 2008·2 cites·33 claims
- 1140US2009220782A1Method of Forming Gallium Arsenide-On-InsulatorAGENCY SCIENCE TECH & RES·Filed 2009·Application pending·0 cites
- 1230US2007272955A1Reliable ContactsAGENCY SCIENCE TECH & RES·Filed 2004·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Dongzhi Chi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →