Inventor · disambiguated record
Dongseok Han
Also filed as: HAN DONGSEOK
4 granted patents·5 pending applications·2 citations·filing 2019–2025
58Inventor score
Files withSAMSUNG ELECTRONICS CO LTD9
Top patents by PatentIndex Score
9 records- 0170US10818503B2Method of etching at low temperature and plasma etching apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 27, 2020·2 cites·16 claims
- 0266US12476089B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Nov 18, 2025·0 cites·19 claims
- 0366US2025146917A1Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing waferSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0462US12222362B2Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing waferSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Feb 11, 2025·0 cites·17 claims
- 0558US2025226259A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0654US12183555B2Substrate processing apparatus and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Dec 31, 2024·0 cites·20 claims
- 0750US2024379334A1Coolant tube block assembly and semiconductor processing device including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0848US2023143327A1Focus ring, substrate processing apparatus including the same, and substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0942US2025391695A1Substrate treatment apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →