Inventor · disambiguated record
Dong-Won Jung
Also filed as: JUNG DONG-WON
24 granted patents·87 citations·filing 1998–2024
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD15AUROS TECHNOLOGY INC8JEJU NATIONAL UNIV INDUSTRY ACADEMIC COOPERATION FOUNDATION1
Top patents by PatentIndex Score
24 records- 0183US12482688B2Overlay measurement device and method, and system and program thereforAUROS TECHNOLOGY INC·Filed 2024·Granted Nov 25, 2025·0 cites·11 claims
- 0283US12334382B2Overlay measurement device and method, and system and program thereforAUROS TECHNOLOGY INC·Filed 2024·Granted Jun 17, 2025·0 cites·9 claims
- 0383US12235590B2Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device thereforAUROS TECHNOLOGY INC·Filed 2024·Granted Feb 25, 2025·0 cites·8 claims
- 0482US12341047B2Overlay measurement device and method, and system and program thereforAUROS TECHNOLOGY INC·Filed 2024·Granted Jun 24, 2025·0 cites·11 claims
- 0582US12169364B2Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device thereforAUROS TECHNOLOGY INC·Filed 2024·Granted Dec 17, 2024·0 cites·8 claims
- 0682US12169365B2Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device thereforAUROS TECHNOLOGY INC·Filed 2024·Granted Dec 17, 2024·0 cites·8 claims
- 0782US6537727B2Resist composition comprising photosensitive polymer having loctone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Mar 25, 2003·16 cites·18 claims
- 0881US12009243B2Overlay measurement device and method, and system and program thereforAUROS TECHNOLOGY INC·Filed 2023·Granted Jun 11, 2024·0 cites·17 claims
- 0981US6472120B1Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Oct 29, 2002·16 cites·6 claims
- 1080US11960214B1Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device thereforAUROS TECHNOLOGY INC·Filed 2023·Granted Apr 16, 2024·0 cites·8 claims
- 1174US6277538B1Photosensitive polymer having cyclic backbone and resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 21, 2001·13 cites·11 claims
- 1267US6300036B1Photosensitive polymers and chemically amplified photoresist compositions using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Oct 9, 2001·13 cites·13 claims
- 1362US6642336B1Photosensitive polymerSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Nov 4, 2003·6 cites·21 claims
- 1462US6280903B1Chemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 28, 2001·5 cites·8 claims
- 1556US6596459B1Photosensitive polymer and resist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jul 22, 2003·4 cites·16 claims
- 1653US10252310B2Tube flanging methodJEJU NATIONAL UNIV INDUSTRY ACADEMIC COOPERATION FOUNDATION·Filed 2013·Granted Apr 9, 2019·0 cites·8 claims
- 1751US6503687B2Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jan 7, 2003·3 cites·25 claims
- 1848US6593441B2Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jul 15, 2003·1 cites·11 claims
- 1944US7241552B2Resist composition comprising photosensitive polymer having lactone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 10, 2007·0 cites·8 claims
- 2042US7045267B2Resist composition comprising photosensitive polymer having lactone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 16, 2006·0 cites·24 claims
- 2142US6114084AChemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Sep 5, 2000·6 cites·6 claims
- 2241US6893793B2Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 17, 2005·0 cites·8 claims
- 2338US7084227B2Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 1, 2006·0 cites·4 claims
- 2437US6287747B1Photosensitive polymer having cyclic backbone and resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 11, 2001·4 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →