Inventor · disambiguated record
Doug Yong Sung
Also filed as: SUNG DOUG YONG
17 granted patents·10 pending applications·65 citations·filing 2007–2022
90Inventor score
Top patents by PatentIndex Score
27 records- 0194US9378931B2Pulse plasma apparatus and drive method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 28, 2016·39 cites·20 claims
- 0291US10395900B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 27, 2019·7 cites·12 claims
- 0387US9564295B2Diagnosis system for pulsed plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Feb 7, 2017·7 cites·18 claims
- 0485US9601397B1Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the systemSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Mar 21, 2017·4 cites·20 claims
- 0579US11735396B2Inductively coupled plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Aug 22, 2023·1 cites·20 claims
- 0679US10481005B2Semiconductor substrate measuring apparatus and plasma treatment apparatus using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 19, 2019·3 cites·20 claims
- 0776US10229818B2Apparatus for monitoring process chamberSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Mar 12, 2019·2 cites·20 claims
- 0870US10964511B2Semiconductor manufacturing device and method of operating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 30, 2021·2 cites·19 claims
- 0966US12437969B2Plasma processing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Oct 7, 2025·0 cites·14 claims
- 1060US10903053B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 26, 2021·0 cites·14 claims
- 1157US10971343B2Apparatus for monitoring process chamberSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Apr 6, 2021·0 cites·20 claims
- 1254US2009064932A1Apparatus for HDP-CVD and method of forming insulating layer using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1353US12046451B2Plasma etching apparatus and method for operating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 23, 2024·0 cites·20 claims
- 1452US11501953B2Plasma processing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 15, 2022·0 cites·16 claims
- 1551US10566176B2Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the systemSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Feb 18, 2020·0 cites·19 claims
- 1647US2010048003A1Plasma processing apparatus and method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1746US2008314318A1Plasma processing apparatus and method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1845US10629467B2Electrostatic chuck and plasma apparatus for processing substrates having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 21, 2020·0 cites·23 claims
- 1945US2008314408A1Plasma etching apparatus and chamber cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 2044US2010083902A1Plasma generating deviceSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 2144US2008119049A1Plasma etching method and apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2244US2008317965A1Plasma processing apparatus and methodSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 2341US2010009097A1Deposition Apparatus and Deposition Method Using the SameSUNG DOUG-YONG·Filed 2009·Application pending·0 cites
- 2439US2019043768A1Methods for Fabricating Semiconductor Devices Using a Fringe SignalSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 2534US8062538B2Etching apparatus and method for semiconductor deviceSUNG DOUG YONG·Filed 2008·Granted Nov 22, 2011·0 cites·7 claims
- 2633US10276349B2Plasma processing deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Apr 30, 2019·0 cites·12 claims
- 2729US2015206716A1Plasma generating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →