Inventor · disambiguated record
Donald L. Wilson
Also filed as: WILSON DONALD L · WILSON DONALD LESLIE
8 granted patents·1,070 citations·filing 1994–2000
91Inventor score
Files withIBM8
Top patents by PatentIndex Score
8 records- 0198US5431734AAluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical controlIBM·Filed 1994·Granted Jul 11, 1995·431 cites·4 claims
- 0297US5665608AMethod of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical controlIBM·Filed 1995·Granted Sep 9, 1997·478 cites·4 claims
- 0386US6488778B1Apparatus and method for controlling wafer environment between thermal clean and thermal processingIBM·Filed 2000·Granted Dec 3, 2002·44 cites·52 claims
- 0473US5614247AApparatus for chemical vapor deposition of aluminum oxideIBM·Filed 1994·Granted Mar 25, 1997·32 cites·5 claims
- 0570US5728222AApparatus for chemical vapor deposition of aluminum oxideIBM·Filed 1995·Granted Mar 17, 1998·33 cites·10 claims
- 0669US5648113AAluminum oxide LPCVD systemIBM·Filed 1994·Granted Jul 15, 1997·25 cites·12 claims
- 0756US5540777AAluminum oxide LPCVD systemIBM·Filed 1995·Granted Jul 30, 1996·17 cites·7 claims
- 0845US5425810ARemovable gas injectors for use in chemical vapor deposition of aluminium oxideIBM·Filed 1994·Granted Jun 20, 1995·10 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →