Inventor · disambiguated record
Duncan W. Brown
Also filed as: BROWN DUNCAN · BROWN DUNCAN W
22 granted patents·1 pending application·2,318 citations·filing 1986–2004
97Inventor score
Top patents by PatentIndex Score
23 records- 0199US6156581AGaN-based devices using (Ga, AL, In)N base layersADVANCED TECH MATERIALS·Filed 1997·Granted Dec 5, 2000·507 cites·62 claims
- 0298US5840897AMetal complex source reagents for chemical vapor depositionADVANCED TECH MATERIALS·Filed 1995·Granted Nov 24, 1998·275 cites·9 claims
- 0398US5453494AMetal complex source reagents for MOCVDADVANCED TECH MATERIALS·Filed 1994·Granted Sep 26, 1995·276 cites·15 claims
- 0497US6533874B1GaN-based devices using thick (Ga, Al, In)N base layersADVANCED TECH MATERIALS·Filed 2000·Granted Mar 18, 2003·232 cites·34 claims
- 0597US4853148AProcess and composition for drying of gaseous hydrogen halidesADVANCED TECH MATERIALS·Filed 1987·Granted Aug 1, 1989·60 cites·9 claims
- 0696US5225561ASource reagent compounds for MOCVD of refractory films containing group IIA elementsADVANCED TECH MATERIALS·Filed 1990·Granted Jul 6, 1993·181 cites·35 claims
- 0795US5919522AGrowth of BaSrTiO3 using polyamine-based precursorsADVANCED TECH MATERIALS·Filed 1997·Granted Jul 6, 1999·149 cites·22 claims
- 0895US5280012AMethod of forming a superconducting oxide layer by MOCVDADVANCED TECH MATERIALS·Filed 1992·Granted Jan 18, 1994·152 cites·19 claims
- 0995US4761395AProcess and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1987·Granted Aug 2, 1988·72 cites·19 claims
- 1089US6126996AMetal complex source reagents for chemical vapor depositionADVANCED TECH MATERIALS·Filed 1997·Granted Oct 3, 2000·87 cites·50 claims
- 1189US4925646AProcess and composition for drying of gaseous hydrogen halidesADVANCED TECH MATERIALS·Filed 1989·Granted May 15, 1990·46 cites·15 claims
- 1287US4923716AChemical vapor desposition of silicon carbideHUGHES AIRCRAFT CO·Filed 1988·Granted May 8, 1990·53 cites·15 claims
- 1381US5051785AN-type semiconducting diamond, and method of making the sameADVANCED TECH MATERIALS·Filed 1989·Granted Sep 24, 1991·52 cites·8 claims
- 1479US5015411AProcess, composition, and apparatus for purifying inert gases to remove Lewis acid and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1990·Granted May 14, 1991·35 cites·12 claims
- 1573US4983363AApparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1988·Granted Jan 8, 1991·21 cites·19 claims
- 1671US6027547AFluid storage and dispensing vessel with modified high surface area solid as fluid storage mediumADVANCED TECH MATERIALS·Filed 1998·Granted Feb 22, 2000·39 cites·32 claims
- 1768US5312983AOrganometallic tellurium compounds useful in chemical vapor deposition processesADVANCED TECH MATERIALS·Filed 1991·Granted May 17, 1994·32 cites·4 claims
- 1858US4950419AProcess, composition, and apparatus for purifying inert gases to remove lewis acid and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1988·Granted Aug 21, 1990·15 cites·16 claims
- 1957US4781900AProcess and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1988·Granted Nov 1, 1988·14 cites·15 claims
- 2052US4797227AProcess and composition for purifying hydrogen selenide and hydrogen telluride, to remove moisture and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1987·Granted Jan 10, 1989·11 cites·17 claims
- 2143US4865822AProcess for purifying hydrogen selenide and hydrogen telluride, to remove moisture and oxidant impurities therefromADVANCED TECH MATERIALS·Filed 1988·Granted Sep 12, 1989·7 cites·9 claims
- 2236US2007269987A1Polishing Liquid for Cmp Process and Polishing MethodSANYO CHEMICAL IND LTD·Filed 2004·Application pending·0 cites
- 2331US4920068AMetalorganic vapor phase epitaxial growth of group II-VI semiconductor materialsAMERICAN CYANAMID CO·Filed 1986·Granted Apr 24, 1990·2 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →