Inventor · disambiguated record
Earl Vedere Atnip
Also filed as: ATNIP EARL V · ATNIP EARL VEDERE
7 granted patents·4 pending applications·14 citations·filing 1997–2019
76Inventor score
Top patents by PatentIndex Score
11 records- 0174US8780434B1MEMS device with sloped supportTEXAS INSTRUMENTS INC·Filed 2013·Granted Jul 15, 2014·4 cites·20 claims
- 0253US8120155B2Reduced stiction and mechanical memory in MEMS devicesATNIP EARL V·Filed 2008·Granted Feb 21, 2012·1 cites·32 claims
- 0352US9446947B2Use of metal native oxide to control stress gradient and bending moment of a released MEMS structureTEXAS INSTRUMENTS INC·Filed 2014·Granted Sep 20, 2016·0 cites·14 claims
- 0450US9656860B2Use of metal native oxide to control stress gradient and bending moment of a released MEMS structureTEXAS INSTRUMENTS INC·Filed 2016·Granted May 23, 2017·0 cites·6 claims
- 0547US2009243011A1Manufacturing Optical MEMS with Thin-Film Anti-Reflective LayersTEXAS INSTRUMENTS INC·Filed 2008·Application pending·0 cites
- 0646US8736936B2Manufacturing optical MEMS with thin-film anti-reflective layersATNIP EARL V·Filed 2012·Granted May 27, 2014·0 cites·20 claims
- 0745US11511989B2MEMS via with enhanced electrical and mechanical integrityTEXAS INSTRUMENTS INC·Filed 2019·Granted Nov 29, 2022·0 cites·20 claims
- 0843US2017176740A1Method of fabricating a microelectronic device with buried dark layersTEXAS INSTRUMENTS INC·Filed 2016·Application pending·0 cites
- 0938US2009067025A1Method and System for Filling Voids in Electromechanical SystemsTEXAS INSTRUMENTS INC·Filed 2007·Application pending·0 cites
- 1037US6030754APhotoresist removal without organic solvent following ashing operationTEXAS INSTRUMENTS INC·Filed 1997·Granted Feb 29, 2000·9 cites·5 claims
- 1136US2017174510A1Method of addressing film liftoff in mems fabricationTEXAS INSTRUMENTS INC·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Earl Vedere Atnip files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →