Inventor · disambiguated record
Edward D. Babich
Also filed as: BABICH EDWARD · BABICH EDWARD D · BABICH EDWARD DARKO
24 granted patents·687 citations·filing 1980–2001
97Inventor score
Top patents by PatentIndex Score
24 records- 0196US5830332ASputter deposition of hydrogenated amorphous carbon film and applications thereofIBM·Filed 1997·Granted Nov 3, 1998·267 cites·51 claims
- 0293US6685853B1Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewithIBM·Filed 2000·Granted Feb 3, 2004·79 cites·9 claims
- 0380US4782008APlasma-resistant polymeric material, preparation thereof, and use thereofIBM·Filed 1985·Granted Nov 1, 1988·33 cites·25 claims
- 0473US6436605B1Plasma resistant composition and use thereofIBM·Filed 1999·Granted Aug 20, 2002·31 cites·25 claims
- 0570US5059512AUltraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositionsIBM·Filed 1989·Granted Oct 22, 1991·27 cites·16 claims
- 0669US5286599ABase developable negative photoresist composition and use thereofIBM·Filed 1991·Granted Feb 15, 1994·23 cites·35 claims
- 0767US6251569B1Forming a pattern of a negative photoresistIBM·Filed 1999·Granted Jun 26, 2001·23 cites·25 claims
- 0865US6132644AEnergy sensitive electrically conductive admixturesIBM·Filed 1998·Granted Oct 17, 2000·28 cites·7 claims
- 0961US5457005ADry developable photoresist and use thereofIBM·Filed 1993·Granted Oct 10, 1995·14 cites·15 claims
- 1060US6617086B2Forming a pattern of a negative photoresistIBM·Filed 2001·Granted Sep 9, 2003·5 cites·21 claims
- 1160US5593812APhotoresist having increased sensitivity and use thereofIBM·Filed 1995·Granted Jan 14, 1997·18 cites·18 claims
- 1260US4693960APhotolithographic etching process using organosilicon polymer compositionIBM·Filed 1986·Granted Sep 15, 1987·17 cites·10 claims
- 1357US5141817ADielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stabilityIBM·Filed 1989·Granted Aug 25, 1992·18 cites·15 claims
- 1457US4981909APlasma-resistant polymeric material, preparation thereof, and use thereofIBM·Filed 1988·Granted Jan 1, 1991·12 cites·19 claims
- 1555US5229251ADry developable photoresist containing an epoxide, organosilicon and onium saltIBM·Filed 1991·Granted Jul 20, 1993·15 cites·23 claims
- 1655US4603195AOrganosilicon compound and use thereof in photolithographyIBM·Filed 1983·Granted Jul 29, 1986·11 cites·24 claims
- 1750US5753412APhotoresist having increased sensitivity and use thereofIBM·Filed 1996·Granted May 19, 1998·11 cites·31 claims
- 1850US5098816AMethod for forming a pattern of a photoresistIBM·Filed 1991·Granted Mar 24, 1992·10 cites·12 claims
- 1949US5110711AMethod for forming a patternIBM·Filed 1991·Granted May 5, 1992·9 cites·8 claims
- 2047US5770345APhotoresist having increased sensitivity and use thereofIBM·Filed 1996·Granted Jun 23, 1998·9 cites·15 claims
- 2145US5115095AEpoxy functional organosilicon polymerIBM·Filed 1991·Granted May 19, 1992·7 cites·6 claims
- 2243US5565529ADielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stabilityIBM·Filed 1993·Granted Oct 15, 1996·11 cites·10 claims
- 2340US5238773AAlkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groupsIBM·Filed 1992·Granted Aug 24, 1993·5 cites·18 claims
- 2431US4369897AProduct storing and dispensing apparatusFAWN ENG CORP·Filed 1980·Granted Jan 25, 1983·4 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →