Inventor · disambiguated record
Edward W. Conrad
Also filed as: CONRAD EDWARD · CONRAD EDWARD W · CONRAD EDWARD WINSTON
34 granted patents·1,759 citations·filing 1992–2010
98Inventor score
Top patents by PatentIndex Score
34 records- 0197US6016357AFeedback method to repair phase shift masksIBM·Filed 1997·Granted Jan 18, 2000·201 cites·23 claims
- 0296US5963329AMethod and apparatus for measuring the profile of small repeating linesIBM·Filed 1997·Granted Oct 5, 1999·554 cites·28 claims
- 0394US6425112B1Auto correction of error checked simulated printed imagesIBM·Filed 1999·Granted Jul 23, 2002·235 cites·24 claims
- 0491US6735492B2Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settingsIBM·Filed 2002·Granted May 11, 2004·61 cites·32 claims
- 0589US6395438B1Method of etch bias proximity correctionIBM·Filed 2001·Granted May 28, 2002·33 cites·20 claims
- 0689US6238850B1Method of forming sharp corners in a photoresist layerIBM·Filed 1999·Granted May 29, 2001·79 cites·12 claims
- 0788US7627622B2System and method of curve fittingIBM·Filed 2004·Granted Dec 1, 2009·80 cites·30 claims
- 0888US6528219B1Dynamic alignment scheme for a photolithography systemIBM·Filed 2000·Granted Mar 4, 2003·33 cites·28 claims
- 0987US6922600B1System and method for optimizing manufacturing processes using real time partitioned process capability analysisIBM·Filed 2004·Granted Jul 26, 2005·31 cites·29 claims
- 1085US6373975B1Error checking of simulated printed images with process window effects includedIBM·Filed 1999·Granted Apr 16, 2002·87 cites·25 claims
- 1183US6539321B2Method for edge bias correction of topography-induced linewidth variationIBM·Filed 2001·Granted Mar 25, 2003·22 cites·62 claims
- 1283US5980647AMetal removal cleaning process and apparatusIBM·Filed 1997·Granted Nov 9, 1999·74 cites·20 claims
- 1378US7257247B2Mask defect analysis systemIBM·Filed 2002·Granted Aug 14, 2007·13 cites·27 claims
- 1476US7492941B2Mask defect analysis systemIBM·Filed 2007·Granted Feb 17, 2009·3 cites·23 claims
- 1575US6694498B2Feed-forward lithographic overlay offset method and systemIBM·Filed 2001·Granted Feb 17, 2004·15 cites·20 claims
- 1675US6214494B1Serif mask design methodology based on enhancing high spatial frequency contribution for improved printabilityIBM·Filed 1998·Granted Apr 10, 2001·34 cites·22 claims
- 1772US7492940B2Mask defect analysis systemIBM·Filed 2007·Granted Feb 17, 2009·2 cites·12 claims
- 1871US6383719B1Process for enhanced lithographic imagingIBM·Filed 1998·Granted May 7, 2002·32 cites·75 claims
- 1966US6965808B1System and method for optimizing metrology sampling in APC applicationsIBM·Filed 2004·Granted Nov 15, 2005·12 cites·23 claims
- 2066US6879719B1Method for measurement of full-two dimensional submicron shapesIBM·Filed 2000·Granted Apr 12, 2005·15 cites·18 claims
- 2166US6704695B1Interactive optical proximity correction design methodIBM·Filed 1999·Granted Mar 9, 2004·24 cites·23 claims
- 2265US8619236B2Determining lithographic set point using optical proximity correction verification simulationBRUCE JAMES A·Filed 2010·Granted Dec 31, 2013·1 cites·11 claims
- 2364US6268908B1Micro adjustable illumination apertureIBM·Filed 1999·Granted Jul 31, 2001·22 cites·15 claims
- 2462US6261724B1Method of modifying a microchip layout data set to generate a predicted mask printed data setIBM·Filed 1999·Granted Jul 17, 2001·20 cites·13 claims
- 2561US6667136B2Method to control nested to isolated line printingIBM·Filed 2002·Granted Dec 23, 2003·5 cites·9 claims
- 2660US8219964B2Method for creating electrically testable patternsBRUCE JAMES A·Filed 2010·Granted Jul 10, 2012·1 cites·30 claims
- 2759US6949458B2Self-aligned contact areas for sidewall image transfer formed conductorsIBM·Filed 2003·Granted Sep 27, 2005·7 cites·20 claims
- 2858US5325180AApparatus for identifying and distinguishing temperature and system induced measuring errorsIBM·Filed 1992·Granted Jun 28, 1994·31 cites·10 claims
- 2952US6429469B1Optical Proximity Correction Structures Having Decoupling CapacitorsIBM·Filed 2000·Granted Aug 6, 2002·5 cites·7 claims
- 3049US6566759B1Self-aligned contact areas for sidewall image transfer formed conductorsIBM·Filed 1999·Granted May 20, 2003·12 cites·19 claims
- 3140US7171319B2Method and apparatus to separate field and grid parameters on first level wafersIBM·Filed 2004·Granted Jan 30, 2007·0 cites·19 claims
- 3240US6258490B1Transmission control mask utilized to reduce foreshortening effectsIBM·Filed 1999·Granted Jul 10, 2001·6 cites·15 claims
- 3338US6458493B2Method to control nested to isolated line printingIBM·Filed 1999·Granted Oct 1, 2002·4 cites·12 claims
- 3438US6387596B2Method of forming resist images by periodic pattern removalIBM·Filed 1999·Granted May 14, 2002·5 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →