Inventor · disambiguated record
Eiichi Hoshino
Also filed as: HOSHINO EIICHI
10 granted patents·2 pending applications·73 citations·filing 1985–2020
87Inventor score
Top patents by PatentIndex Score
12 records- 0186US11214197B2Vehicle surrounding area monitoring device, vehicle surrounding area monitoring method, vehicle, and storage medium storing program for the vehicle surrounding area monitoring deviceHONDA MOTOR CO LTD·Filed 2020·Granted Jan 4, 2022·2 cites·8 claims
- 0283US11427186B2Parking assist systemHONDA MOTOR CO LTD·Filed 2020·Granted Aug 30, 2022·2 cites·12 claims
- 0361US11511626B2Information display device for vehicleHONDA MOTOR CO LTD·Filed 2019·Granted Nov 29, 2022·1 cites·8 claims
- 0457US6372392B1Transparent optical device and fabrication method thereofFUJITSU LTD·Filed 1997·Granted Apr 16, 2002·20 cites·32 claims
- 0553US5906912AProcesses for forming resist pattern and for producing semiconductor deviceFUJITSU LTD·Filed 1997·Granted May 25, 1999·20 cites·33 claims
- 0646US11046203B2Capacitor state display device for vehicleHONDA MOTOR CO LTD·Filed 2019·Granted Jun 29, 2021·0 cites·18 claims
- 0743US2003173529A1Mask pattern inspection system and mask pattern-inspecting methodFUJITSU LTD·Filed 2003·Application pending·0 cites
- 0841US4613401AMethod for dry etching a chromium or chromium oxide filmFUJITSU LTD·Filed 1985·Granted Sep 23, 1986·11 cites·8 claims
- 0939US6551749B1Developer and method for forming resist pattern and photomask produced by use thereofFUJITSU LTD·Filed 2000·Granted Apr 22, 2003·4 cites·10 claims
- 1038US6465137B2Resist composition and pattern forming processFUJITSU LTD·Filed 1999·Granted Oct 15, 2002·5 cites·7 claims
- 1138US6143473AFilm patterning method utilizing post-development residue removerFUJITSU LTD·Filed 1999·Granted Nov 7, 2000·8 cites·6 claims
- 1234US2002014403A1Method of fabricating reflective mask, and methods and apparatus of detecting wet etching end point and inspecting side etching amountFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →