Inventor · disambiguated record
Eiichiro Ishimizu
Also filed as: ISHIMIZU Eiichiro
7 granted patents·4 pending applications·0 citations·filing 2016–2025
69Inventor score
Top patents by PatentIndex Score
11 records- 0172US12227674B2Polishing composition comprising polishing particles having high water affinityNISSAN CHEMICAL CORP·Filed 2022·Granted Feb 18, 2025·0 cites·13 claims
- 0269US2025136843A1Polishing composition comprising polishing particles having high water affinityNISSAN CHEMICAL CORP·Filed 2025·Application pending·0 cites
- 0366US11984320B2Method for polishing silicon wafer with reduced wear on carrier, and polishing liquid used thereinNISSAN CHEMICAL CORP·Filed 2023·Granted May 14, 2024·0 cites·7 claims
- 0458US2020308448A1Polishing composition comprising polishing particles having high water affinityNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 0553US11884844B2Composition for post-polishing to be used after primary polishing of silicon wafersNISSAN CHEMICAL CORP·Filed 2022·Granted Jan 30, 2024·0 cites·12 claims
- 0653US11621171B2Method for polishing silicon wafer with reduced wear on carrier, and polishing liquid used thereinNISSAN CHEMICAL CORP·Filed 2019·Granted Apr 4, 2023·0 cites·13 claims
- 0748US11873420B2Cation-containing polishing composition for eliminating protrusions around laser markNISSAN CHEMICAL CORP·Filed 2020·Granted Jan 16, 2024·0 cites·12 claims
- 0844US10865113B2Method for producing purified aqueous solution of silicic acidNISSAN CHEMICAL IND LTD·Filed 2016·Granted Dec 15, 2020·0 cites·1 claims
- 0943US2022228031A1Polishing composition using polishing particles containing basic substance and having high water affinityNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 1041US11459486B2Polishing composition containing amphoteric surfactantNISSAN CHEMICAL CORP·Filed 2018·Granted Oct 4, 2022·0 cites·14 claims
- 1134US2020317955A1Composition for polishing for use in eliminating protrusion in periphery of laser markNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →