Inventor · disambiguated record
Eiichi Miyake
Also filed as: MIYAKE EIICHI
11 granted patents·2 pending applications·293 citations·filing 1979–2001
92Inventor score
Top patents by PatentIndex Score
13 records- 0192US5534969AAlignment method and apparatus in an exposing processSANEI GIKEN CO LTD·Filed 1994·Granted Jul 9, 1996·86 cites·17 claims
- 0279US5682228AAlignment method and apparatus in an exposing processSANEI GIKEN CO LTD·Filed 1996·Granted Oct 28, 1997·40 cites·7 claims
- 0376US4888488AExposing apparatus used in fabrication of printed circuit boardsMIYAKE EIICHI·Filed 1988·Granted Dec 19, 1989·27 cites·5 claims
- 0471US4659419ALaminator for sticking film sheet on panel surfaceHAKUTO KK·Filed 1984·Granted Apr 21, 1987·35 cites·14 claims
- 0568US4743325AMethod of sticking film sheet on panel surfaceHAKUTO KK·Filed 1986·Granted May 10, 1988·34 cites·1 claims
- 0658US4842412AExposure apparatus employed for fabricating printed circuit boardsMIYAKE EIICHI·Filed 1987·Granted Jun 27, 1989·21 cites·14 claims
- 0752US6160611AExposing apparatus and methodSANEI GIKEN CO LTD·Filed 1998·Granted Dec 12, 2000·14 cites·23 claims
- 0847US4264397AApparatus for sticking nonconductive tape having plating perforations to sheet metalHAKUTO KK·Filed 1979·Granted Apr 28, 1981·15 cites·2 claims
- 0942US6659152B1LaminatorSANEI GIKEN CO LTD·Filed 1999·Granted Dec 9, 2003·12 cites·10 claims
- 1042US6320659B1Clearance measuring device and method for exposureSANEI GIKEN CO LTD·Filed 2000·Granted Nov 20, 2001·1 cites·14 claims
- 1138US4676069AVapor phase processing apparatusMIYAKE EIICHI·Filed 1986·Granted Jun 30, 1987·8 cites·3 claims
- 1234US2001008442A1Positioning mark and alignment method using the sameFiled 2001·Application pending·0 cites
- 1334US2002079276A1Substrate positioning apparatus and exposure apparatusSANEI GIKEN CO LTD·Filed 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Eiichi Miyake files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →