Inventor · disambiguated record
Eiichiro Nishimura
Also filed as: NISHIMURA EIICHIRO
12 granted patents·4 pending applications·89 citations·filing 1989–2017
88Inventor score
Top patents by PatentIndex Score
16 records- 0179US9941415B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Apr 10, 2018·3 cites·9 claims
- 0275US6738125B2Liquid crystal display apparatus and method for manufacturing sameSHARP KK·Filed 2000·Granted May 18, 2004·17 cites·12 claims
- 0375US5066110ALiquid crystal display apparatusSHARP KK·Filed 1989·Granted Nov 19, 1991·45 cites·8 claims
- 0473US10000842B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 19, 2018·2 cites·5 claims
- 0573US9670578B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 6, 2017·2 cites·10 claims
- 0665US10128108B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Nov 13, 2018·1 cites·4 claims
- 0755US5191455ADriving circuit for a liquid crystal display apparatusSHARP KK·Filed 1990·Granted Mar 2, 1993·19 cites·12 claims
- 0850US9732004B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Aug 15, 2017·0 cites·9 claims
- 0950US9688580B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 27, 2017·0 cites·9 claims
- 1049US9768316B2Oxide semiconductor thin film and thin film transistorSUMITOMO METAL MINING CO·Filed 2014·Granted Sep 19, 2017·0 cites·7 claims
- 1147US9543447B2Oxynitride semiconductor thin filmSUMITOMO METAL MINING CO·Filed 2014·Granted Jan 10, 2017·0 cites·7 claims
- 1244US2017077243A1Sintered oxide, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Application pending·0 cites
- 1344US2017076943A1Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Application pending·0 cites
- 1437US9670577B2Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering targetSUMITOMO METAL MINING CO·Filed 2015·Granted Jun 6, 2017·0 cites·10 claims
- 1536US2019062900A1Oxide sintered body and sputtering targetSUMITOMO METAL MINING CO·Filed 2017·Application pending·0 cites
- 1636US2019081182A1Oxide semiconductor thin film, manufacturing method for oxide semiconductor thin film, and thin film transistor using oxide semiconductor thin filmSUMITOMO METAL MINING CO·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →